Results 41 to 50 of about 2,582 (264)
Memristive Motion‐Streak Neuron for Spatiotemporal Multiple Object Detection
This work proposes motion‐streak neuron hardware using amorphous In–Ga–Zn–O optoelectronic memristors and dynamic memristors for spatiotemporal multiple‐object detection. The motion streak neuron array processes optical and electrical stimuli, allowing speed‐dependent filament relaxation to encode motion trajectories.
Hyungjun Park +9 more
wiley +1 more source
Slurry Design for Chemical Mechanical Polishing
Chemical Mechanical Polishing (CMP) process is widely used in the microelectronics industry for planarization of metal and dielectric layers to achieve multi-layer metallization.
G. Bahar Basim, Brij M. Moudgil
doaj +1 more source
Volatile Memristive Devices With Tunable Temporal Dynamics For Event‐Based Sensing
Tunable volatile memristive devices can serve various neural‐inspired tasks that require different time windows of information retention. The ionic‐based volatility of the presented Pt/a‐STO/TaOx/Ta device stack can be reproducibly and controllably tuned in multiple ways.
Dimitrios Spithouris +7 more
wiley +1 more source
A Te2Se/Si heterojunction designed through atomistic simulations reduces oxide‐related traps, dark current, and noise compared with pure tellurium devices. This CMOS‐compatible platform enables short‐wave infrared detection and high‐contrast imaging in a 14 × 14 array, highlighting a scalable strategy for robust, low‐noise SWIR photodetectors and image
Byeongjin Park +13 more
wiley +1 more source
Investigation on pad′s conditioning technology and improving self-conditioning of fixed abrasive pad
The surface features of abrasive pad deform during chemical mechanical polishing and as a result the polishing ability of the pad is dramatically reduced.Pad conditioning improves the pad surface profile and consequently the wafer profile.In addition,it ...
JU Zhilan, ZHU Yongwei, ZHANG Fubao
doaj
Development of Epoxy Resin Polishing Pads for Glass Polishing
This paper describes newly developed polishing pads for glass finishing that employs an epoxy resin instead of a conventional polyurethane resin. The porosity of the polishing pad was controlled by changing the amount of a chemical foaming agents mixed with a prepolymer epoxy resin.
MURATA, Junji +5 more
openaire +2 more sources
This review highlights recent advances in material extrusion 3D printing of self‐healing polymers, focusing on the interplay between material chemistry, rheology, hardware customization, and process optimization. Filament‐ and ink‐based extrusion strategies, multimaterial architectures, and postprocessing approaches are discussed for applications in ...
Antonio Pavone +2 more
wiley +1 more source
Friend, Not Foe: Lowered Tissue Reactivity to Long‐Term Polyimide Implants
The choice of optimal neural probe designs remains a major challenge in the field of neurotechnology. This study investigated the biocompatibility of several probe variations, including material, thickness, width, and implantation strategy. It highlights the clear advantage of soft polyimide probes over stiff silicon probes for better device ...
Corinne Orlemann +11 more
wiley +1 more source
A physics‐informed property‐bridging framework links high‐throughput hardness screening to tensile performance in quenching and partitioning steels. By transferring metallurgically guided representations across properties, a single alloy composition is designed to achieve multiple strength grades through heat‐treatment tuning alone, offering a ...
Xiaolu Wei +7 more
wiley +1 more source
Removal rate of abrasive polishing of epoxy resin optical surface
To realize carbon fiber reinforced plastic (CFRP) mirrors, the high-precision polishing of an epoxy resin surface, which is the reflection surface of such mirrors, is required.
Takahito IGAWA +3 more
doaj +1 more source

