Results 221 to 230 of about 5,036 (258)
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Physical Review Letters, 1996
An attempt was made to separate thermal from electronic effects during laser sputtering of gold by partitioning the target surface energy between steady-state electron beam heating and pulsed laser heating. For flat starting surfaces and a peak surface temperature of $\ensuremath{\sim}2700\mathrm{K}$, the Au translational energy remains $(2\ensuremath{-
, Bennett, , Krajnovich, , Grigoropoulos
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An attempt was made to separate thermal from electronic effects during laser sputtering of gold by partitioning the target surface energy between steady-state electron beam heating and pulsed laser heating. For flat starting surfaces and a peak surface temperature of $\ensuremath{\sim}2700\mathrm{K}$, the Au translational energy remains $(2\ensuremath{-
, Bennett, , Krajnovich, , Grigoropoulos
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Laser-pulse sputtering of atoms and molecules Part II. Recondensation effects
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1994Abstract When solids are sputtered with sufficiently intense laser pulses, particle release takes place, and a terminating expansion then develops. The resulting gas-dynamic processes depend on whether backscattered particles are subject to recondensation or reflection.
Roger Kelly, Antonio Miotello
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AlN thin films obtained by pulsed laser deposition and reactive sputtering
2003 International Semiconductor Conference. CAS 2003 Proceedings (IEEE Cat. No.03TH8676), 2004AlN thin films with thickness in nanometer range were prepared by pulsed laser deposition techniques and by reactive sputtering techniques. Investigations by XRD, SEM, AFM, and piezoelectric measurement were performed on the obtained AlN thin films. A comparison between some of the properties of the two types of films is presented.
F. Craciunoiu +6 more
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Pulsed KrF laser annealing of RF sputtered ZnS:Mn thin films
Applied Surface Science, 1999Abstract Pulsed KrF laser annealing (PLA) of ZnS:Mn thin (800 nm) film phosphors has been investigated as an alternative to thermal annealing for the fabrication of electroluminescent devices. The influence of the surrounding gas pressure during exposure, the energy density (Ed) of the laser beam and the effect of double irradiation is reported ...
E.A. Mastio +4 more
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Carbon nitride films deposited by reactive sputtering and pulsed laser ablation
Thin Solid Films, 2004Abstract Carbon nitride films were deposited by reactive sputtering process and by pulsed laser ablation process with substrate bias. By applying the RF bias, it enables the ion irradiation on to the depositing film surface continuously. ECR plasma source was used for reactive sputtering.
Toshiaki Yasui +4 more
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Magnetron sputter pulsed laser deposition: technique and process control developments
Surface and Coatings Technology, 2004Abstract This paper investigates the use of process control in the deposition of nanocomposite thin-films by the magnetron-sputtering/pulsed laser deposition (MSPLD) method. A series of YSZ/Au films was deposited with closed loop feedback control, based on plume emissions, used to update both the laser and magnetron power settings simultaneously to ...
J.G. Jones, A.A. Voevodin
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Optimal Simulation for the Thickness Uniformity of the Film Deposited by Pulse Laser Sputtering
ACTA PHOTONICA SINICA, 2010Method of off-axis rotated scan is studied in order to improve the thickness uniformity of the film by pulse laser deposition (PLD). Based on the principle and spatial distribution of plasma,radial distribution formula of film thickness is formed. Effects on uniformity of film deposited by method of off-axis rotated scan are simulated numerically.
王晟 WANG Sheng +5 more
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Optical damage of sputtered gold films irradiated with femtosecond laser pulses
SPIE Proceedings, 2001Multi-shot damage tests were performed of gold coated mirrors in the femtosecond and in the nanosecond laser pulse regime. Sputtered gold films from different suppliers of various thicknesses were investigated. Considerable differences in the optical quality and the damage threshold are reported.
R. Boedefeld +6 more
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Teflon sputtering under pulsed CO/sub 2/-laser irradiation
2003 Conference on Lasers and Electro-Optics Europe (CLEO/Europe 2003) (IEEE Cat. No.03TH8666), 2005Teflon plate is irradiated by pulsed CO/sub 2/ laser. A crater with even edges without traces of melt or blackening was formed after irradiation of the teflon plate surface by focussed pulsed radiation of CO/sub 2/-laser with p.r.r. of /spl sim/1 Hz. Increasing of PTFE surface temperature resulted in increase of efficiency of teflon mass removed from ...
A.V. Fedenev +4 more
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Pulsed laser annealing of rf sputtered amorphous Si-H films doped with arsenic
Journal of Applied Physics, 1982Arsenic doped amorphous silicon layers have been deposited on silicon single crystals by rf cathodic sputtering of a silicon target in a reactive argon-hydrogen mixture, and annealed with a Q-switched ruby laser. Topographic analysis of the laser irradiated layers indicate that a crater is formed due to an evaporation of material which could be related
Fogarassy, E. +4 more
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