Results 11 to 20 of about 55,048 (148)
Effect of Plasma Etching Depth on Subsurface Defects in Quartz Crystal Elements
After the plasma etching of quartz crystal, the crystal lattice underwent changes in response to the length of plasma etching time. The lattice arrangement of quartz crystal was the most orderly after plasma etching for 1000 nm, and with the increase in ...
Qingzhi Li +4 more
doaj +1 more source
Deep reactive-ion etching (DRIE) is commonly used for high aspect ratio silicon micromachining. However, scalloping, which is the result of the alternating Bosch process of DRIE, can cause many problems in the subsequent process and degrade device ...
Jin Soo Park +7 more
doaj +1 more source
Deep Reactive Ion Etching of Z-Cut Alpha Quartz for MEMS Resonant Devices Fabrication
Quartz is widely used in microelectromechanical systems (MEMS). Especially, MEMS quartz resonators are applied to sensors and serve as sensitive elements. The capability of deep etching is a limitation for the application.
Bo Li +4 more
doaj +1 more source
Figuring of optical aluminium devices by reactive ion beam etching [PDF]
Ion beam figuring (IBF) is an established method in high-end surface manufacturing. However, the direct processing of desired materials as standard Al alloys (e.g.
Bauer Jens +3 more
doaj +1 more source
Metasurface Fabrication by Cryogenic and Bosch Deep Reactive Ion Etching
The research field of metasurfaces has attracted considerable attention in recent years due to its high potential to achieve flat, ultrathin optical devices of high performance. Metasurfaces, consisting of artificial patterns of subwavelength dimensions,
Angela M. Baracu +7 more
doaj +1 more source
Reactive ion beam etching – based finishing of optical aluminium surfaces [PDF]
Reactively driven low-energy ion beam machining is a widely used finishing technique for optical aluminium surfaces. Direct RIBE machining with oxygen or nitrogen process gas permits figure error correction of diversely shaped aluminium optics while ...
Ulitschka Melanie +3 more
doaj +1 more source
Reactive Ion Etching Process of Micro Mechanical Pendulum
This paper describes the reactive ion etching (RIE) technique of micro mechanical pendulum chip. Micro mechanical pendulum chip processed by the RIE has excellent performances and surface of the chip is smoother than the chip by wet etching.
Zhang Wei +3 more
doaj +1 more source
Plasma removal of Parylene C [PDF]
Parylene C, an emerging material in microelectromechanical systems, is of particular interest in biomedical and lab-on-a-chip applications where stable, chemically inert surfaces are desired.
Li, Po-Ying, Meng, Ellis, Tai, Yu-Chong
core +1 more source
Residual-free reactive ion etching of gold layers
Metal contacts on semiconductors devices are normally defined by lift-off process, because no well-defined etch processes exist for some rare metals.
Gerhard Franz +3 more
doaj +1 more source
Freestanding nanostructures via reactive ion beam angled etching
Freestanding nanostructures play an important role in optical and mechanical devices for classical and quantum applications. Here, we use reactive ion beam angled etching to fabricate optical resonators in bulk ...
Haig A. Atikian +7 more
doaj +1 more source

