Results 41 to 50 of about 75,080 (331)
Advanced Engineering Materials, EarlyView.Powder metal processing provides scalable advantages in nanoporous (np) metal development. Mechanical alloying is used to produce unique precursors for hybrid nanopore formation by oxide reduction and dealloying. As demonstrated in np Ag, this approach improves process efficiency while promoting smaller ligaments and larger pores, both of which are ...
Mark A. Atwater, Oliver A. Fowler
wiley +1 more source
Tuning Metasurface Dimensions by Soft Nanoimprint Lithography and Reactive Ion Etching
Advanced Photonics Research, 2022 Metasurfaces are ultrathin and flat layers of subwavelength nanostructures composed of metallic or high‐refractive‐index materials. They can alter lightwave properties effectively and show significant application potential in various nanophotonic ...
Xinyi Cao +6 more
doaj +1 more source
The black silicon method: a universal method for determining the parameter setting of a fluorine-based reactive ion etcher in deep silicon trench etching with profile control [PDF]
, 1994 Very deep trenches (up to 200 µm) with high aspect ratios (up to 10) in silicon and polymers are etched using a fluorine-based plasma (SF6/O2/CHF3). Isotropic, positively and negatively (i.e.
de Boer, Meint J. +4 more
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Planar Solid‐State Nanopores Toward Scalable Nanofluidic Integration Based on CMOS Technology
Advanced Engineering Materials, EarlyView.We present a scalable silicon‐based fabrication strategy for planar solid‐state nanopores to enable their integration with complex nanofluidic systems. Prototype devices demonstrate normal voltage‐current characteristics, good noise performance, and appreciable streaming currents. Our CMOS‐compatible fabrication process offers precise geometric control
Ngan Hoang Pham +7 more
wiley +1 more source
Two-step Fabrication of Large Area SiO2/Si Membranes
Medžiagotyra, 2012 Two-step fabrication technique of SiO2/Si membrane combining the deep local etching of double side polished and thermally oxidized silicon <100> wafer in tetramethylammonium hydroxide (TMAH) water solution and SF6/O2 reactive ion etching is ...
Viktoras GRIGALIŪNAS +7 more
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Research of reactive ion and plasma-chemical etching effect on diamond coating surface morphology [PDF]
, 2016 The effect of treatment by reactive ion etching in an argon atmosphere, and hydrogen plasma etching in a glow discharge plasma on the surface of the diamond films was investigated.
Gaydaychuk, Alexander Valerievich +2 more
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Advanced Engineering Materials, EarlyView.The corrosion performance of AlSi7Mg and AlSi10Mg alloys produced through selective laser melting (SLM) was examined under compressive stress in a chloride environment. Electrochemical analyses, including open‐circuit potential (OCP), potentiodynamic polarization (CPP), and electrochemical impedance spectroscopy (EIS), were complemented by scanning ...
Femi John Akinfolarin +2 more
wiley +1 more source
Silicone engineered anisotropic lithography for ultrahigh-density OLEDs
Nature Communications, 2022 Ultrahigh-resolution patterning with high-throughput and high-fidelity is highly in demand for expanding the potential of OLEDs. Here, the authors report that silicone-incorporated organic light-emitting semiconductors can achieve anisotropic lithography
Hyukmin Kweon +13 more
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Metal mask free dry-etching process for integrated optical devices applying highly photostabilized resist. [PDF]
, 2006 Photostabilization is a widely used post lithographic resist treatment process, which allows to harden the resist profile in order to maintain critical dimensions and to increase selectivity in subsequent process steps such as reactive ion etching.
Driessen, A. +3 more
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Fabrication of photonic band-gap crystals [PDF]
, 1995 We describe the fabrication of three-dimensional photonic crystals using a reproducible and reliable procedure consisting of electron beam lithography followed by a sequence of dry etching steps.
Cheng, C. C., Scherer, A.
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