Reactive ion etching - Open Access .click

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RF reactor with asymmetrical electrodes for reactive ion etching of semiconductors [PDF]

Технологія та конструювання в електронній апаратурі, 2011
Results of experimental and theoretical study of RF CCP reactor for reactive ion etching of semiconductors are presented. Breakdown curve and domain of the discharge existence are measured in various gases (argon, fluorocarbon, oxygen).
S. V. Dudin +3 more
doaj +1 more source

Low-pressure plasma-etching of bulk polymer materials using gas mixture of CF4 and O2

AIP Advances, 2013
In this study, we have proposed a low-pressure reactive ion etching of bulk polymer materials with a gas mixture of CF4 and O2, and have achieved precise fabrication of poly(methyl methacrylate) (PMMA) and perfluoroalkoxy (PFA) bulk polymer plates with ...
Hirofumi Nabesawa +6 more
doaj +1 more source

Crystal structure induced residue formation on 4H-SiC by reactive ion etching

AIP Advances, 2016
The (000 1 ¯ ) C face of 4H-SiC wafer was etched by reactive ion etching in SF6/O2 plasma. The effect of etching
Yi-hong Liu +5 more
doaj +1 more source

Role of CF₄ Addition in Gas-Phase Variations in HF Plasma for Cryogenic Etching: Insights from Plasma Simulation and Experimental Correlation

Plasma
The fabrication of semiconductor devices with three-dimensional architectures imposes unprecedented demands on advanced plasma dry etching processes. These include the simultaneous requirements of high throughput, high material selectivity, and precise ...
Shigeyuki Takagi +4 more
doaj +1 more source

17.6% Conversion Efficiency Multicrystalline Silicon Solar Cells Using the Reactive Ion Etching with the Damage Removal Etching

International Journal of Photoenergy, 2012
For lower reflectance, we applied a maskless plasma texturing technique using reactive ion etching (RIE) on acidic-textured multicrystalline silicon (mc-Si) wafer. RIE texturing had a deep and narrow textured surface and showed excellent low reflectance.
Ji-Myung Shim +12 more
doaj +1 more source

Low-Damage Reactive Ion Etching of Nanoplasmonic Waveguides with Ultrathin Noble Metal Films

Applied Sciences, 2019
Nanoplasmonic waveguides utilizing surface plasmon polaritons (SPPs) propagation have been investigated for more than 15 years and are now well understood.
Alina A. Dobronosova +14 more
doaj +1 more source

A Review: Inductively Coupled Plasma Reactive Ion Etching of Silicon Carbide. [PDF]

Materials (Basel), 2021
Racka-Szmidt K +4 more
europepmc +1 more source

reactive ion etching

Citation: 'reactive ion etching' in the IUPAC Compendium of Chemical Terminology, 5th ed.; International Union of Pure and Applied Chemistry; 2025. Online version 5.0.0, 2025. 10.1351/goldbook.09563 • License: The IUPAC Gold Book is licensed under Creative Commons Attribution-ShareAlike CC BY-SA 4.0 International for individual ...
openaire +1 more source

Single crystal diamond micro-disk resonators by focused ion beam milling

APL Photonics, 2018
We report on single crystal diamond micro-disk resonators fabricated in bulk chemical vapor deposition diamond plates (3 mm × 3 mm × 0.15 mm) using a combination of deep reactive ion etching and Focused Ion Beam (FIB) milling.
Teodoro Graziosi, Sichen Mi, Marcell Kiss, Niels Quack +3 more
doaj +1 more source

Unraveling the Mechanism of Maskless Nanopatterning of Black Silicon by CF₄/H₂ Plasma Reactive-Ion Etching. [PDF]

ACS Omega, 2022
Ghezzi F +8 more
europepmc +1 more source

physics
7. clean energy
etching

deep reactive ion etching