Results 21 to 30 of about 1,889,328 (287)

Reactive ion beam etching – based finishing of optical aluminium surfaces [PDF]

EPJ Web of Conferences, 2019
Reactively driven low-energy ion beam machining is a widely used finishing technique for optical aluminium surfaces. Direct RIBE machining with oxygen or nitrogen process gas permits figure error correction of diversely shaped aluminium optics while ...
Ulitschka Melanie, Bauer Jens, Frost Frank, Arnold Thomas   +3 more
doaj   +1 more source

Residual-free reactive ion etching of gold layers

AIP Advances, 2018
Metal contacts on semiconductors devices are normally defined by lift-off process, because no well-defined etch processes exist for some rare metals.
Gerhard Franz, Wolfhard Oberhausen, Ralf Meyer, Markus-Christian Amann   +3 more
doaj   +1 more source

A New Reactive Atom Plasma Technology (RAPT) for Precision Machining: the Etching of ULE® Surface [PDF]

, 2006
Results on reactive atom plasma etching performed on ULE® (Corning Ultra Low Expansion) glass samples at atmospheric pressure are presented for the first time.
Lyford, N., Fanara, C., Shore, Paul, Carr, J., Nicholls, John R., Kelley, J., Sommer, P.   +6 more
core   +1 more source

Freestanding nanostructures via reactive ion beam angled etching

APL Photonics, 2017
Freestanding nanostructures play an important role in optical and mechanical devices for classical and quantum applications. Here, we use reactive ion beam angled etching to fabricate optical resonators in bulk ...
Haig A. Atikian, Pawel Latawiec, Michael J. Burek, Young-Ik Sohn, Srujan Meesala, Normand Gravel, Ammar B. Kouki, Marko Lončar   +7 more
doaj   +1 more source

A large-size and polarization-independent two dimensional grating fabricated by scanned reactive-ion-beam etching

Nanophotonics, 2022
Scanned reactive-ion-beam etching method was proposed to transfer two-dimensional mask patterns into quartz substrate, which would produce a larger-size and polarization-independent two-dimensional grating.
Zhang Wei, Li Wenhao, Zhang Tong, Zheng Zhongming, Chi Zhendong, Jiang Yanxiu, Wu Na   +6 more
doaj   +1 more source

Dry etching of monocrystalline silicon using a laser-induced reactive micro plasma

Applied Surface Science Advances, 2021
Dry etching is a prevalent technique for pattern transfer and material removal in microelectronics, optics and photonics due to its high precision material removal with low surface and subsurface damage.
Robert Heinke, Martin Ehrhardt, Pierre Lorenz, Klaus Zimmer   +3 more
doaj   +1 more source

Three-Dimensional Simulation of DRIE Process Based on the Narrow Band Level Set and Monte Carlo Method

Micromachines, 2018
A three-dimensional topography simulation of deep reactive ion etching (DRIE) is developed based on the narrow band level set method for surface evolution and Monte Carlo method for flux distribution.
Jia-Cheng Yu, Zai-Fa Zhou, Jia-Le Su, Chang-Feng Xia, Xin-Wei Zhang, Zong-Ze Wu, Qing-An Huang   +6 more
doaj   +1 more source

The preparation of V2CTx by facile hydrothermal-assisted etching processing and its performance in lithium-ion battery

Journal of Materials Research and Technology, 2020
In this study, high-purity V2CTx MXene was successfully synthesized by etching V2AlC with fluoride and hydrochloric acid mixed solution using a hydrothermal-assisted method. This method is more concise and effective and has a low level of danger.
Libo Wang, Darong Liu, Weiwei Lian, Qianku Hu, Xuqing Liu, Aiguo Zhou   +5 more
doaj   +1 more source

Recent Progress of Black Silicon: From Fabrications to Applications

Nanomaterials, 2020
Since black silicon was discovered by coincidence, the special material was explored for many amazing material characteristics in optical, surface topography, and so on.
Zheng Fan, Danfeng Cui, Zengxing Zhang, Zhou Zhao, Hongmei Chen, Yanyun Fan, Penglu Li, Zhidong Zhang, Chenyang Xue, Shubin Yan   +9 more
doaj   +1 more source

Plasma mass spectrometric analysis and control of reactive ion etching of InP and related compounds

, 2022
S.98-102The authors report on the investigation of mechanisms involved in the reactive ion etching of InP and related compounds by in situ determination of plasma species using mass spectroscopy.
Schmid, H.
core   +1 more source