Results 31 to 40 of about 1,889,328 (287)

The Influence of Etching Method on the Occurrence of Defect Levels in III-V and II-VI Materials

open access: yesNanomaterials
The influence of the etching method on the occurrence of defect levels in InAs/InAsSb type-II superlattice (T2SLs) and MCT photodiode is presented. For both analyzed detectors, the etching process was performed by two methods: wet chemical etching and ...
Kinga Majkowycz   +5 more
doaj   +1 more source

Entropy‐Driven Design of Low‐Melting‐Point Alloys via Compositionally Complex Strategy

open access: yesAdvanced Engineering Materials, EarlyView.
Conventional low‐melting‐point alloys (LMPAs) are limited by a narrow compositional space and inherent property trade‐offs. This review presents an entropy‐driven design strategy that overcomes these limitations, ushering in a new class of low‐melting‐point compositionally complex alloys (LMCCAs).
Yinghui Shang   +6 more
wiley   +1 more source

Tuning Metasurface Dimensions by Soft Nanoimprint Lithography and Reactive Ion Etching

open access: yesAdvanced Photonics Research, 2022
Metasurfaces are ultrathin and flat layers of subwavelength nanostructures composed of metallic or high‐refractive‐index materials. They can alter lightwave properties effectively and show significant application potential in various nanophotonic ...
Xinyi Cao   +6 more
doaj   +1 more source

Fabrication Routes for Ionic Conducting Fiber Strain Sensors

open access: yesAdvanced Engineering Materials, EarlyView.
Ionic conducting fiber strain sensors (ICFSs) offer compliant, textile‐integrable sensing. Thus far, the commercialization of ICFSs has been constrained by fiber fabrication routes. This review provides a fabrication‐centric analysis of ICFSs correlating processing strategies with material properties and scalability.
Leo John Kershaw   +3 more
wiley   +1 more source

Two-step Fabrication of Large Area SiO2/Si Membranes

open access: yesMedžiagotyra, 2012
Two-step fabrication technique of SiO2/Si membrane combining the deep local etching of double side polished and thermally oxidized silicon <100> wafer in tetramethylammonium hydroxide (TMAH) water solution and SF6/O2 reactive ion etching is ...
Viktoras GRIGALIŪNAS   +7 more
doaj   +1 more source

Silicone engineered anisotropic lithography for ultrahigh-density OLEDs

open access: yesNature Communications, 2022
Ultrahigh-resolution patterning with high-throughput and high-fidelity is highly in demand for expanding the potential of OLEDs. Here, the authors report that silicone-incorporated organic light-emitting semiconductors can achieve anisotropic lithography
Hyukmin Kweon   +13 more
doaj   +1 more source

Concentrator cell methodology in the regeneration and recycle of chromium etching solutions using membrane technology [PDF]

open access: yes, 2006
The regeneration of chromium (VI) and the recovery of etched copper from chromium etching solutions by electrodialysis is improved by the addition of a concentrator cell, using ion exchange resins or activated carbon cloth as concentrator media, in the ...
Ganguli, B, Grimes, SM, Chaudhary, AJ
core   +1 more source

The Role of Ultra‐Thin Passive Films and Organic Adsorbates on Aluminum Chips for a Friction‐Induced Solid‐State Recycling Process

open access: yesAdvanced Engineering Materials, EarlyView.
Despite benefits to storage stability and handleability of aluminum scrap, octadecyl phosphonic acid (ODPA) SAMs reduce the tensile strength of wires produced using friction‐induced recycling. Etching and methyl diphosphonic acid (MDPA) coatings, however, have little effect.
Timothy D. Goller   +3 more
wiley   +1 more source

Biomass Native Structure Into Functional Carbon‐Based Catalysts for Fenton‐Like Reactions

open access: yesAdvanced Functional Materials, EarlyView.
This study indicates that eight biomasses with 2D flaky and 1D acicular structures influence surface O types, morphology, defects, N doping, sp2 C, and Co nanoparticles loading in three series of carbon, N‐doped carbon, and cobalt/graphitic carbon. This work identifies how these structural factors impact catalytic pathways, enhancing selective electron
Wenjie Tian   +7 more
wiley   +1 more source

Atomic Depth Image Transfer of Large-Area Optical Quartz Materials Based on Pulsed Ion Beam

open access: yesMicromachines
The high-efficiency preparation of large-area microstructures of optical materials and precision graphic etching technology is one of the most important application directions in the atomic and near-atomic-scale manufacturing industry.
Shuyang Ran   +7 more
doaj   +1 more source

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