Results 11 to 20 of about 1,889,328 (287)
Reactive Ion Etching Process of Micro Mechanical Pendulum [PDF]
MATEC Web of Conferences, 2017 This paper describes the reactive ion etching (RIE) technique of micro mechanical pendulum chip. Micro mechanical pendulum chip processed by the RIE has excellent performances and surface of the chip is smoother than the chip by wet etching.
Zhang Wei +3 more
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Heat transfer properties of laser assisted plasma processing [PDF]
, 2012 Laser assisted plasma processing (LAPP) is a novel extension to already established Reactive Atom Plasma (RAP) processing for atmospheric pressure dry chemical etching of silicon based materials; this is mainly applied for optical uses.
Parkins, Jonathon
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Deep Reactive Ion Etching of Cylindrical Nanopores in Silicon for Photonic Crystals [PDF]
, 2022 Periodic arrays of deep nanopores etched in silicon by deep reactive ion etching are desirable structures for photonic crystals and other nanostructure for silicon nanophotonics. Previous studies focused on realizing as deep as possible nanopores with as
Melissa J, Goodwin +3 more
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Dry etching and sputtering [PDF]
, 2004 Dry etching is an important process for micro- and nanofabrication. Sputtering effects can arise in two contexts within a dry-etch process. Incoming ions cause removal of volatile products that arise from the interaction between the dry-etch plasma and ...
Wilkinson, C.D.W., Rahman, M.
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Micro and Nano Engineering, 2022 Recently, it has been demonstrated that Silicon Carbide (SiC) membranes can be used in quantum sensing and MEMS applications. One of the important steps for the production of such membranes is the removal of the substrate material in order to form ...
Mahsa Mokhtarzadeh +3 more
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Exploring Strategies to Contact 3D Nano-Pillars
Nanomaterials, 2020 This contribution explores different strategies to electrically contact vertical pillars with diameters less than 100 nm. Two process strategies have been defined, the first based on Atomic Force Microscope (AFM) indentation and the second based on ...
Esteve Amat +10 more
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Effect of Plasma Etching Depth on Subsurface Defects in Quartz Crystal Elements
Crystals, 2023 After the plasma etching of quartz crystal, the crystal lattice underwent changes in response to the length of plasma etching time. The lattice arrangement of quartz crystal was the most orderly after plasma etching for 1000 nm, and with the increase in ...
Qingzhi Li +4 more
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Micro and Nano Systems Letters, 2020 Deep reactive-ion etching (DRIE) is commonly used for high aspect ratio silicon micromachining. However, scalloping, which is the result of the alternating Bosch process of DRIE, can cause many problems in the subsequent process and degrade device ...
Jin Soo Park +7 more
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Figuring of optical aluminium devices by reactive ion beam etching [PDF]
EPJ Web of Conferences, 2019 Ion beam figuring (IBF) is an established method in high-end surface manufacturing. However, the direct processing of desired materials as standard Al alloys (e.g.
Bauer Jens +3 more
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ICP Etching of Silicon for Micro and Nanoscale Devices [PDF]
, 2010 The physical structuring of silicon is one of the cornerstones of modern microelectronics and integrated circuits. Typical structuring of silicon requires generating a plasma to chemically or physically etch silicon.
Henry, Michael David
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