Results 21 to 30 of about 55,048 (148)

A large-size and polarization-independent two dimensional grating fabricated by scanned reactive-ion-beam etching

Nanophotonics, 2022
Scanned reactive-ion-beam etching method was proposed to transfer two-dimensional mask patterns into quartz substrate, which would produce a larger-size and polarization-independent two-dimensional grating.
Zhang Wei, Li Wenhao, Zhang Tong, Zheng Zhongming, Chi Zhendong, Jiang Yanxiu, Wu Na   +6 more
doaj   +1 more source

Dry etching of monocrystalline silicon using a laser-induced reactive micro plasma

Applied Surface Science Advances, 2021
Dry etching is a prevalent technique for pattern transfer and material removal in microelectronics, optics and photonics due to its high precision material removal with low surface and subsurface damage.
Robert Heinke, Martin Ehrhardt, Pierre Lorenz, Klaus Zimmer   +3 more
doaj   +1 more source

Thermally assisted ion beam etching of polytetrafluoroethylene, a new technique for high aspect ratio etching of MEMS [PDF]

, 1996
In micromechanics, the etching of high aspect ratio structures in polymers is a prime technology. Normally, oxygen-based reactive ion etching or the LIGA technique are used to achieve this goal.
Berenschot, Erwin, Burger, Gert-Jan, Elwenspoek, Miko, Gardeniers, Han, Jansen, Henri   +4 more
core   +3 more sources

Double heterostructure lasers with facets formed by a hybrid wet and reactive-ion-etching technique [PDF]

, 1985
Double heterostructure lasers were fabricated in which one of the laser facets was produced by a hybrid wet and reactive-ion-etching technique. This technique is suitable for GaAs/GaAlAs heterostructure lasers and utilizes the selectivity of the plasma ...
Margalit, S., Salzman, J., Venkatesan, T., Yariv, A.   +3 more
core   +1 more source

The preparation of V2CTx by facile hydrothermal-assisted etching processing and its performance in lithium-ion battery

Journal of Materials Research and Technology, 2020
In this study, high-purity V2CTx MXene was successfully synthesized by etching V2AlC with fluoride and hydrochloric acid mixed solution using a hydrothermal-assisted method. This method is more concise and effective and has a low level of danger.
Libo Wang, Darong Liu, Weiwei Lian, Qianku Hu, Xuqing Liu, Aiguo Zhou   +5 more
doaj   +1 more source

Fabrication of bismuth nanowires with a silver nanocrystal shadowmask [PDF]

, 2000
We fabricated bismuth (Bi) nanowires with low energy electron beam lithography using silver (Ag) nanocrystal shadowmasks and a subsequent chlorine reactive ion etching. Submicron-size metal contacts on the single Bi nanowire were successfully prepared by
Abraham, M., Cho, S. L., Choi, S. H., Chung, S. W., Heath, J. R., Ketterson, J. B., King, E. E., Leung, M. S., Morgan, B. A., Presser, N., Robertson, R. E., Stupian, G. W., Tueling, M. B., Wang, K. L.   +13 more
core   +1 more source

Three-Dimensional Simulation of DRIE Process Based on the Narrow Band Level Set and Monte Carlo Method

Micromachines, 2018
A three-dimensional topography simulation of deep reactive ion etching (DRIE) is developed based on the narrow band level set method for surface evolution and Monte Carlo method for flux distribution.
Jia-Cheng Yu, Zai-Fa Zhou, Jia-Le Su, Chang-Feng Xia, Xin-Wei Zhang, Zong-Ze Wu, Qing-An Huang   +6 more
doaj   +1 more source

Recent Progress of Black Silicon: From Fabrications to Applications

Nanomaterials, 2020
Since black silicon was discovered by coincidence, the special material was explored for many amazing material characteristics in optical, surface topography, and so on.
Zheng Fan, Danfeng Cui, Zengxing Zhang, Zhou Zhao, Hongmei Chen, Yanyun Fan, Penglu Li, Zhidong Zhang, Chenyang Xue, Shubin Yan   +9 more
doaj   +1 more source

The Influence of Etching Method on the Occurrence of Defect Levels in III-V and II-VI Materials

Nanomaterials
The influence of the etching method on the occurrence of defect levels in InAs/InAsSb type-II superlattice (T2SLs) and MCT photodiode is presented. For both analyzed detectors, the etching process was performed by two methods: wet chemical etching and ...
Kinga Majkowycz, Krzysztof Murawski, Małgorzata Kopytko, Krzesimir Nowakowski-Szkudlarek, Marta Witkowska-Baran, Piotr Martyniuk   +5 more
doaj   +1 more source

Fabrication of photonic band-gap crystals [PDF]

, 1995
We describe the fabrication of three-dimensional photonic crystals using a reproducible and reliable procedure consisting of electron beam lithography followed by a sequence of dry etching steps.
Cheng, C. C., Scherer, A.
core   +1 more source