Results 41 to 50 of about 55,048 (148)
Ga^+ beam lithography for nanoscale silicon reactive ion etching [PDF]
, 2010 By using a dry etch chemistry which relies on the highly preferential etching of silicon, over that of gallium (Ga), we show resist-free fabrication of precision, high aspect ratio nanostructures and microstructures in silicon using a focused ion beam ...
Chhim, B. +3 more
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AIP Advances, 2017 We focused on inductively coupled plasma and reactive ion etching (ICP–RIE) for etching GaN and tried to fabricate distinctive GaN structures under optimized chemical etching conditions.
N. Okada +8 more
doaj +1 more source
The role of fluorine-containing ultra-thin layer in controlling boron thermal diffusion into silicon
Journal of Telecommunications and Information Technology, 2023 We have investigated the influence of silicon dioxide reactive ion etching (RIE) parameters on the composition of the polymer layer that is formed during this process on top of the etched layer, and finally, the role of this layer in high- temperature ...
Małgorzata Kalisz +3 more
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Nd-doped aluminum oxide integrated amplifiers at 880 nm, 1060 nm, and 1330 nm [PDF]
, 2010 Neodymium-doped Al2O3 layers were deposited on thermally oxidized Si substrates and channel waveguides were patterned using reactive-ion etching. Internal net gain on the Nd3+ transitions at 880, 1064, and 1330 nm was investigated,\ud yielding a maximum ...
Ay, F. +4 more
core +1 more source
Plasma Processing of Large Curved Surfaces for SRF Cavity Modification [PDF]
, 2014 Plasma based surface modification of niobium is a promising alternative to wet etching of superconducting radio frequency (SRF) cavities. The development of the technology based on Cl2/Ar plasma etching has to address several crucial parameters which ...
Im, Do +5 more
core +4 more sources
Applied Sciences, 2019 Silicon micropillars have been suggested as one of the techniques for improving the efficiency of devices. Fabrication of micropillars has been done in several ways—Metal Assisted Chemical Etching (MACE) and Reactive Ion Etching (RIE) being the ...
Amal Kabalan
doaj +1 more source
Redeposition-Free Deep Etching in Small KY(WO4)2 Samples
Micromachines, 2020 KY(WO4)2 is a promising material for on-chip laser sources. Deep etching of small KY(WO4)2 samples in combination with various thin film deposition techniques is desirable for the manufacturing of such devices.
Simen Mikalsen Martinussen +3 more
doaj +1 more source
Guidelines for etching silicon MEMS structures using fluorine high-density plasmas at cryogenic temperatures [PDF]
, 2002 This paper presents guidelines for the deep reactive ion etching (DRIE) of silicon MEMS structures, employing SF/sub 6//O/sub 2/-based high-density plasmas at cryogenic temperatures.
Boer, Meint J. de +6 more
core +2 more sources
Proceedings, 2017 Vertically aligned 3D gallium nitride (GaN) nanowire arrays with sub-50 nm feature sizes were fabricated using a nanosphere lift-off lithography (NSLL) technique combined with hybrid top-down etching steps (i.e., inductively coupled plasma dry reactive ...
Tony Granz +12 more
doaj +1 more source
Lithographic band gap tuning in photonic band gap crystals [PDF]
, 1996 We describe the lithographic control over the spectral response of three-dimensional photonic crystals. By precise microfabrication of the geometry using a reproducible and reliable procedure consisting of electron beam lithography followed by dry ...
Arbet-Engels, V. +3 more
core +1 more source