Results 61 to 70 of about 55,048 (148)
Parylene etching techniques for microfluidics and bioMEMS [PDF]
, 2005 Parylene C (poly(monochloro-p-xylylene)) is a member of a unique family of thermoplastic, crystalline polymers. Compared to other polymers, parylene films are exceptionally conformal and chemically inert owing to its vapor deposition polymerization (VDP)
Meng, Ellis, Tai, Yu-Chong
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InP nanocrystals on silicon for optoelectronic applications
, 2012 One of the solutions enabling performance progress, which can overcome the downsizing limit in silicon technology, is the integration of different functional optoelectronic devices within a single chip. Silicon with its indirect band gap has poor optical
Helm, Manfred +10 more
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Low-pressure plasma-etching of bulk polymer materials using gas mixture of CF4 and O2
AIP Advances, 2013 In this study, we have proposed a low-pressure reactive ion etching of bulk polymer materials with a gas mixture of CF4 and O2, and have achieved precise fabrication of poly(methyl methacrylate) (PMMA) and perfluoroalkoxy (PFA) bulk polymer plates with ...
Hirofumi Nabesawa +6 more
doaj +1 more source
Josephson junctions with centered step and local variation of critical current density
, 2009 Superconductor-insulator-ferromagnet-superconductor (SIFS) Josephson tunnel junctions based on Nb\Al2O3\Ni\Cu\Nb stacks with a thickness step in the metallic NiCu interlayer were fabricated.
Weides, M.
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Dry etching of metallization [PDF]
The production dry etch processes are reviewed from the perspective of microelectronic fabrication applications. The major dry etch processes used in the fabrication of microelectronic devices can be divided into two categories - plasma processes in ...
Bollinger, D.
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Crystal structure induced residue formation on 4H-SiC by reactive ion etching
AIP Advances, 2016 The (000 1 ¯ ) C face of 4H-SiC wafer was etched by reactive ion etching in SF6/O2 plasma. The effect of etching
Yi-hong Liu +5 more
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Fabrication of Polymeric Multimode Waveguides for Application in the Local Area Network and Optical Interconnects. [PDF]
, 2000 We report the fabrication of multimode polymeric waveguides using spin coating, photolithography, and reactive ion etching. Different layer structures have been used, e.g., a UV curable resin is used as a core layer and PMMA as a lower and upper cladding.
Driessen, A. +4 more
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PlasmaThe fabrication of semiconductor devices with three-dimensional architectures imposes unprecedented demands on advanced plasma dry etching processes. These include the simultaneous requirements of high throughput, high material selectivity, and precise ...
Shigeyuki Takagi +4 more
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Plasma Nanoscience: from Nano-Solids in Plasmas to Nano-Plasmas in Solids
, 2013 The unique plasma-specific features and physical phenomena in the organization of nanoscale solid-state systems in a broad range of elemental composition, structure, and dimensionality are critically reviewed.
Meyyappan, M. +2 more
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Characterization of GaN Nanorods Fabricated Using Ni Nanomasking and Reactive Ion Etching: A Top-Down Approach [PDF]
, 2013 Large thermal mismatch between GaN surface and sapphire results in compressive stress in Gallium Nitride (GaN) layer which degrades the device performance.
Christiansen, S. +4 more
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