Results 71 to 80 of about 55,048 (148)
International Journal of Photoenergy, 2012 For lower reflectance, we applied a maskless plasma texturing technique using reactive ion etching (RIE) on acidic-textured multicrystalline silicon (mc-Si) wafer. RIE texturing had a deep and narrow textured surface and showed excellent low reflectance.
Ji-Myung Shim +12 more
doaj +1 more source
Low-Damage Reactive Ion Etching of Nanoplasmonic Waveguides with Ultrathin Noble Metal Films
Applied Sciences, 2019 Nanoplasmonic waveguides utilizing surface plasmon polaritons (SPPs) propagation have been investigated for more than 15 years and are now well understood.
Alina A. Dobronosova +14 more
doaj +1 more source
Fabricating Ultra-Thin Silicon Carbide Diaphragms [PDF]
A process for fabricating relatively thin SiC diaphragms may include fast Reactive Ion Etching (RIE) followed by Dopant Selective Reactive Ion Etching (DSRIE). The process may produce silicon carbide (SiC) diaphragms thinner than 10 microns.
Okojie, Robert S.
core +1 more source
Single crystal diamond micro-disk resonators by focused ion beam milling
APL Photonics, 2018 We report on single crystal diamond micro-disk resonators fabricated in bulk chemical vapor deposition diamond plates (3 mm × 3 mm × 0.15 mm) using a combination of deep reactive ion etching and Focused Ion Beam (FIB) milling.
Teodoro Graziosi +3 more
doaj +1 more source
Single-Step CMOS Compatible Fabrication of High Aspect Ratio Microchannels Embedded in Silicon
Proceedings, 2017 This paper presents a new method for the CMOS compatible fabrication of microchannels integrated into a silicon substrate. In a single-step DRIE process (Deep Reactive Ion Etching) a network of microchannels with High Aspect Ratio (HAR) up to 10, can be ...
Marta Kluba +4 more
doaj +1 more source
Citation: 'reactive ion etching' in the IUPAC Compendium of Chemical Terminology, 5th ed.; International Union of Pure and Applied Chemistry; 2025. Online version 5.0.0, 2025. 10.1351/goldbook.09563 • License: The IUPAC Gold Book is licensed under Creative Commons Attribution-ShareAlike CC BY-SA 4.0 International for individual ...
openaire +1 more source
Low-loss silicon nitride Kerr-microresonators fabricated with metallic etch masks via metal lift-off
Scientific ReportsStoichiometric silicon nitride has emerged as a widely used integrated photonic material owing to its high index of refraction, nonlinear optical properties, and broad transparency window spanning visible to mid-IR frequencies.
Gabriel M. Colación +3 more
doaj +1 more source
New Colloidal Lithographic Nanopatterns Fabricated by Combining Pre-Heating and Reactive Ion Etching
Nanoscale Research Letters, 2009 We report a low-cost and simple method for fabrication of nonspherical colloidal lithographic nanopatterns with a long-range order by preheating and oxygen reactive ion etching of monolayer and double-layer polystyrene spheres.
Cong Chunxiao +3 more
doaj +1 more source
Fabrication of Nanostructures on Surface of Micro-Lens Arrays Using Reactive Ion Etching
MicromachinesIn this study, we fabricated a nanostructure on the surface of the micro-lens array (MLA), which is one of the light extraction technologies of organic light-emitting diodes (OLEDs), by performing the Reactive Ion -Etching (RIE) process. The MLA consists
Tae Jeong Hwang +3 more
doaj +1 more source
Micro and Nano EngineeringThis paper presents the fabrication of widely-spaced high aspect ratio ring-shape pillars (i.e. hollow pillars). Lateral etching of the pillars during deep reactive ion etching is challenging.
Wenhan Hu, Zihao Wang, Aixi Pan, Bo Cui
doaj +1 more source