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Reactive co-sputtered Li-Nb-O thin films with tunable ionic conductivity and dielectric properties for energy storage applications. [PDF]

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Jafarpour S, Naghshara H, Zarenezhad H.
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Reactive magnetron sputtering of ZnO

Journal of Applied Physics, 1981
A planar magnetron with a zinc target is used to sputter zinc oxide in an oxygen atmosphere. Highly oriented zinc oxide films are obtained on a variety of subtrates such as gold, aluminum, platinum, quartz, and oxidized silicon. The sputtering rate is typically 10–20 μm/h for a substrate temperature of 450–500 °C, a substrate-to-target spacing of 4–7 ...
B. T. Khuri-Yakub, J. G. Smits, T. Barbee   +2 more
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Reactive magnetron sputtering: an offline parameter identification method

2021 IEEE 15th International Symposium on Applied Computational Intelligence and Informatics (SACI), 2021
The goal of this paper is the offline parameter identification of the Berg model, intended to be used for magnetron sputtering and thin film deposition process control. A graphical parameter estimation method is developed using simplified equations that contain only the most significant terms in both metallic and poisoned modes of operation.
András Kelemen, Róbert Rossi Madarász
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Reactive sputtering with an unbalanced magnetron

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1992
An unbalanced magnetron uses changes in the configuration of the magnetic field, which confines the plasma close to the sputtering cathode, to allow some of it to ‘‘leak’’ out to impinge on the substrate. An isolated or insulating substrate will acquire a negative bias and be subject to an ion bombardment at that potential. The creation of biases of up
R. P. Howson, H. A. Ja’fer
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A model for reactive magnetron sputtering

Vacuum, 1992
Abstract A steady-state model for the reactive sputtering process in a symmetrical planar magnetron configuration is presented which takes the specific system geometry into consideration. Further to the simulation of the well-known hysteresis effect and its consequences in the composition of the deposited film, the model allows for the calculation of
C.D. Tsiogas, J.N. Avaritsiotis
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Biocompatibility of titanium oxynitride coatings deposited by reactive magnetron sputtering

Bulletin of Experimental Biology and Medicine, 2022
Titanium oxynitride coatings deposited by reactive magnetron sputtering improve biocompatibility of vascular stents by increasing NO production, viability, and adhesion of EA.hy926 cells. Thus, the application of titanium oxynitride coatings is a promising strategy for increasing the biocompatibility of nitinol stents.
I I, Kim, M A, Surovtseva, O V, Poveshchenko, N A, Bondarenko, E V, Chepeleva, I Yu, Zhuravleva   +5 more
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Reactive Magnetron Sputtering of ZnO

1980 Ultrasonics Symposium, 1980
A planar magnetron system is used to sputter zinc o xide on a variety of substrates. target is used, and sputtering is done in an oxygen atmosphere. The zinc oxide films are evaluated by bulk and surface a coustic measurements, scanning electron microscopy, reflection electron diffraction, x-ray diffraction, surface roughness, etching rate, and ...
B.T. Khuri-Yakub, J.G. Smits
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Pressure stability in reactive magnetron sputtering

Thin Solid Films, 1988
Abstract In high rate reactive magnetron sputtering the film deposition results in a substantial pumping rate of the reactive gas. When the depositing film is substoichiometric, the film's consumption of the reactive gas is limited by the arrival rate of that gas and so consumption increases with reactive gas partial pressure.
A.G. Spencer, R.P. Howson, R.W. Lewin
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Reactive magnetron sputtering of TiO films

Surface and Coatings Technology, 2005
This article reports on the hysteresis effect in synthesis of TiO x films prepared by a single magnetron (SM) and dual magnetron (DM), the development of deposition rate α D and elemental and phase composition of these films with increasing partial pressure of oxygen p O2 .
P. Baroch, J. Musil, J. Vlcek, K.H. Nam, J.G. Han   +4 more
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Negative ions in reactive magnetron sputtering

Vakuum in Forschung und Praxis, 2013
AbstractNegative ions are present in magnetron sputtering if electronegative elements are involved. The majority of the negative ions impinging on transparent conductive oxide (TCO) films during growth is O− produced at the oxidised target surface while it is rather unimportant whether it is bulk oxide or a surface oxide formed in reactive sputtering ...
Thomas Welzel, Klaus Ellmer
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