Enhanced ammonia sensing using Pt-decorated single-crystalline SnO<sub>2</sub> nanowires prepared by sputtering. [PDF]
Hung NP +8 more
europepmc +1 more source
SERS Facemask for Rapid and Portable Sensing Mycobacterium Tuberculosis Antigens for TB Screening
Our study introduced an Au─Ag embedded covalent organic framework (U@COF) ‐mediated facemask for sensing TB antigen ESAT‐6/CFP‐10 complex in clinical droplet samples toward TB screening. Practical analysis of clinical samples demonstrated the availability of our facemask, which is capable of identifying the TB subjects (N = 17) from healthy candidates (
Lingzhi Chen +20 more
wiley +1 more source
Oxidation-Tuned CuO<sub><i>x</i></sub> for Spin-Orbit Torque Efficiency Enhancement. [PDF]
Li CJ, Pai CF.
europepmc +1 more source
Synthesis of Iron(II,III) Oxide-Titanium Core-Shell Particles via Magnetron Sputtering for Magnetoactive Elastomers. [PDF]
Padilha Fontoura C +4 more
europepmc +1 more source
The Influence of the Ar/N<sub>2</sub> Ratio During Reactive Magnetron Sputtering of TiN Electrodes on the Resistive Switching Behavior of MIM Devices. [PDF]
Jeżak P +3 more
europepmc +1 more source
Hierarchically Restructured Antibacterial Electrodes for Neural Interfaces: Electrochemical and Microstructural Evolution under Extended Cycling. [PDF]
Panchal K +8 more
europepmc +1 more source
Morphological evolution of silicon surfaces nanopatterned by focused ion beam irradiation. [PDF]
Bhowmik D.
europepmc +1 more source
Fabrication Process Development for Optical Channel Waveguides in Sputtered Aluminum Nitride. [PDF]
Mardani S +4 more
europepmc +1 more source
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Control of reactive sputtering processes
Thin Solid Films, 2005The method of reactive gas control during reactive sputtering strongly influences the deposition rate and film properties of the compound being deposited. Flow control of the reactive gas is the simplest method, but since reactive sputtering is typically done in the compound or poisoned mode of the target, the deposition rate is low compared to the ...
W.D. Sproul, D.J. Christie, D.C. Carter
exaly +2 more sources
Abstract In today's sputtering solutions in the field of precision optics, usually planar targets are used which suffer from inhomogeneous surface erosion. This leads to a drift in uniformity over time, higher material costs and in the case of reactive sputtering an increased tendency to form arcs which cause particle generation.
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