Results 241 to 250 of about 22,223 (308)

Enhanced ammonia sensing using Pt-decorated single-crystalline SnO<sub>2</sub> nanowires prepared by sputtering. [PDF]

open access: yesRSC Adv
Hung NP   +8 more
europepmc   +1 more source

SERS Facemask for Rapid and Portable Sensing Mycobacterium Tuberculosis Antigens for TB Screening

open access: yesAdvanced Science, EarlyView.
Our study introduced an Au─Ag embedded covalent organic framework (U@COF) ‐mediated facemask for sensing TB antigen ESAT‐6/CFP‐10 complex in clinical droplet samples toward TB screening. Practical analysis of clinical samples demonstrated the availability of our facemask, which is capable of identifying the TB subjects (N = 17) from healthy candidates (
Lingzhi Chen   +20 more
wiley   +1 more source

Hierarchically Restructured Antibacterial Electrodes for Neural Interfaces: Electrochemical and Microstructural Evolution under Extended Cycling. [PDF]

open access: yesACS Appl Mater Interfaces
Panchal K   +8 more
europepmc   +1 more source

Fabrication Process Development for Optical Channel Waveguides in Sputtered Aluminum Nitride. [PDF]

open access: yesMicromachines (Basel)
Mardani S   +4 more
europepmc   +1 more source

Control of reactive sputtering processes

Thin Solid Films, 2005
The method of reactive gas control during reactive sputtering strongly influences the deposition rate and film properties of the compound being deposited. Flow control of the reactive gas is the simplest method, but since reactive sputtering is typically done in the compound or poisoned mode of the target, the deposition rate is low compared to the ...
W.D. Sproul, D.J. Christie, D.C. Carter
exaly   +2 more sources

Sputtering of dielectric single layers by metallic mode reactive sputtering and conventional reactive sputtering from cylindrical cathodes in a sputter-up configuration

open access: yesThin Solid Films, 2013
Abstract In today's sputtering solutions in the field of precision optics, usually planar targets are used which suffer from inhomogeneous surface erosion. This leads to a drift in uniformity over time, higher material costs and in the case of reactive sputtering an increased tendency to form arcs which cause particle generation.
Daniel Rademacher   +2 more
openaire   +2 more sources

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