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A Comprehensive Review of Machine Learning Approaches for Semiconductor Device Modeling and Simulation

open access: yesIEEE Access
Application of machine learning (ML) approaches has recently expanded within a wide range of domains, including semiconductor devices. Their strong potential resulted in increasing number of research in semiconductor device modeling and simulation.
Kazi Mohammad Mamun   +2 more
doaj   +4 more sources

Direct Defect-Level Analysis of Metal–Insulator–Metal Capacitor Using Internal Photoemission Spectroscopy

open access: yesIEEE Journal of the Electron Devices Society, 2021
Barrier height ( $\phi _{b}$ ), trap state, bandgap ( $E_{g}$ ), and band alignment information of the metal–ZrO2–metal capacitor have been extracted using internal photoemission (IPE) system.
Tae Jin Yoo   +7 more
doaj   +1 more source

Analysis of High-Temperature Data Retention in 3D Floating-Gate nand Flash Memory Arrays

open access: yesIEEE Journal of the Electron Devices Society, 2023
In this paper, we present a detailed experimental investigation of high-temperature data retention in 3D floating-gate NAND Flash memory arrays. Data reveal that charge detrapping from the cell tunnel oxide and depassivation of traps in the string ...
Gerardo Malavena   +4 more
doaj   +1 more source

Transistor Laser Antenna: Electromagnetic Model in Transmit and Receive Modes

open access: yesIEEE Access, 2022
Transistor laser can drive recent innovative technologies like optical antennas and rectennas. To this end, this semiconductor device requires an accurate electromagnetic model capable of determining the antenna characteristics like radiation pattern ...
Arman Afsari   +3 more
doaj   +1 more source

Neural Approach for Modeling and Optimizing Si-MOSFET Manufacturing

open access: yesIEEE Access, 2020
An optimal design of semiconductor device and its process uniformity are critical factors affecting desired figure-of-merits as well as reducing fabrication cost of fixing possible malfunctioning in semiconductor manufacturing.
Hyun-Chul Choi   +3 more
doaj   +1 more source

Foreword Special Issue on Compact Modeling of Semiconductor Devices

open access: yesIEEE Journal of the Electron Devices Society, 2020
This Special Issue is dedicated to recent research in the field of compact modeling of semiconductor devices. This is the first J-EDS Special Issue on compact modeling.
Benjamin Iniguez   +7 more
doaj   +1 more source

New Compact Modeling Solutions for Organic and Amorphous Oxide TFTs

open access: yesIEEE Journal of the Electron Devices Society, 2021
We review recent compact modeling solutions for Organic and Amorphous Oxide TFTs (OTFTs and AOS TFTs, respectively), which were developed, under the framework of the EU-funded project DOMINO, to address issues specifically connected to the physics of ...
Benjamin Iniguez   +14 more
doaj   +1 more source

Extreme Double/Triple Asymmetric Epitaxial Structure Based Diode Lasers for High Powers and High Efficiencies

open access: yesIEEE Photonics Journal, 2022
In edge-emitting high power laser diodes, the longitudinal spatial hole burning (LSHB) effect induced by the inhomogeneous photon and carrier distributions and the non-linear process, two-photon absorption (TPA), are demonstrated to the key causes of ...
Xiaolei Zhao   +3 more
doaj   +1 more source

The Quantum Hydrodynamic Model for Semiconductor Devices [PDF]

open access: yesSIAM Journal on Applied Mathematics, 1994
The article under review deals with the quantum hydrodynamic (QHD) equations for the charge transport simulation in quantum semiconductor devices. It is well-known that the behaviour of quantum fluid near thermal equilibrium and in the high temperature limit can be approximated by adding \({\mathcal O} (\hbar^ 2)\) terms to the classical fluid ...
openaire   +1 more source

Comprehensive n- and pMOSFET Channel Material Benchmarking and Analysis of CMOS Performance Metrics Considering Quantum Transport and Carrier Scattering Effects

open access: yesIEEE Journal of the Electron Devices Society, 2020
Comprehensive channel material benchmarking for n- and pMOS are performed considering effects of quantum transport and carrier scattering. Various channel material options (Si, InAs, In0.7Ga0.3As, In0.53Ga0.47As, GaAs, and Ge for nMOS, Si and Ge for pMOS)
Raseong Kim, Uygar E. Avci, Ian A. Young
doaj   +1 more source

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