Results 1 to 10 of about 22,820 (167)

Statistical Analysis of Random Telegraph Noises of MOSFET Subthreshold Currents Using a 1M Array Test Chip in a 40 nm Process

open access: yesIEEE Journal of the Electron Devices Society, 2021
It is difficult to measure the random telegraph noises (RTN) of MOSFET subthreshold currents at the sub-pA level directly and accurately. In this work, we used a charge integration method similar to the operation of the CMOS image sensors (CIS) to ...
Calvin Yi-Ping Chao   +7 more
doaj   +1 more source

Random Telegraph Noise Degradation Caused by Hot Carrier Injection in a 0.8 μm-Pitch 8.3Mpixel Stacked CMOS Image Sensor

open access: yesSensors, 2023
In this work, the degradation of the random telegraph noise (RTN) and the threshold voltage (Vt) shift of an 8.3Mpixel stacked CMOS image sensor (CIS) under hot carrier injection (HCI) stress are investigated. We report for the first time the significant
Calvin Yi-Ping Chao   +6 more
doaj   +1 more source

Microbe Manufacturers of Semiconductors [PDF]

open access: yesChemistry & Biology, 2004
Synthesis of cadmium sulfide (CdS) semiconductor nanoparticles within a prokaryotic organism is reported for the first time by Sweeney et al. This paper demonstrates the utility of microorganisms to perform chemistries outside the scope of their "normal" metabolism and offers an environmentally benign synthesis of CdS nanoparticles.
Flenniken, Michelle   +2 more
openaire   +2 more sources

Influence of Thin Fluorine Resin Film on DUV LED Packaging Devices

open access: yesApplied Sciences, 2023
Amorphous fluorine resin is a promising material that can be used for the encapsulation of deep-ultraviolet light-emitting diodes (DUV LEDs) to promote the light output, due to its light characteristics which mean it shows no absorption in the DUV ...
Wenbo Li   +7 more
doaj   +1 more source

VCSEL Quick Fabrication for Assessment of Large Diameter Epitaxial Wafers

open access: yesIEEE Photonics Journal, 2022
Stripped-back representative VCSEL devices with a simple fabrication process that very closely approaches the performance of standard BCB-planarised devices have been produced. These VCSEL Quick Fabrication (VQF) devices achieve threshold currents only 0.
Jack Baker   +8 more
doaj   +1 more source

Field-free spin-orbit torque switching assisted by in-plane unconventional spin torque in ultrathin [Pt/Co]N

open access: yesNature Communications, 2023
Electrical manipulation of magnetization without an external magnetic field is critical for the development of advanced non-volatile magnetic-memory technology that can achieve high memory density and low energy consumption.
Fen Xue   +12 more
doaj   +1 more source

Quick Fabrication VCSELs for Characterisation of Epitaxial Material

open access: yesApplied Sciences, 2021
A systematic analysis of the performance of VCSELs, fabricated with a decreasing number of structural elements, is used to assess the complexity of fabrication (and therefore time) required to obtain sufficient information on epitaxial wafer suitability.
Jack Baker   +9 more
doaj   +1 more source

Extraction and Estimation of Pinned Photodiode Capacitance in CMOS Image Sensors

open access: yesIEEE Journal of the Electron Devices Society, 2014
The pinned photodiode capacitance extraction method proposed by Goiffon et al. is discussed, and two additional new methods are presented and analyzed; one based on the full well dependence on photon flux and the other based on the full well dependence ...
Calvin Yi-Ping Chao   +5 more
doaj   +1 more source

CMOS Image Sensor Random Telegraph Noise Time Constant Extraction From Correlated To Uncorrelated Double Sampling

open access: yesIEEE Journal of the Electron Devices Society, 2017
A new method for on-chip random telegraph noise (RTN) characteristic time constant extraction using the double sampling circuit in an 8.3 Mpixel CMOS image sensor is described.
Calvin Yi-Ping Chao   +5 more
doaj   +1 more source

ML-Based JIT1 Optimization for Throughput Maximization in Cluster Tool Automation

open access: yesApplied Sciences, 2022
The semiconductor etch cluster facility is the most used facility platform in the semiconductor manufacturing process. Optimizing cluster facilities can depend on production schedules and can have a direct impact on productivity.
Youngsoo Kim, Gunwoo Lee, Jongpil Jeong
doaj   +1 more source

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