Results 161 to 170 of about 2,116 (217)
Electron Tri-Layer Enhancement Mode High-Electron-Mobility Transistor: Design and Analysis. [PDF]
Qureshi B, Alharbi AG, Ayub R, Loan SA.
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Ultra-sensitive heterojunction double gate BioTFET device for SARS-CoV-2 biomolecules detection. [PDF]
Vimala P +6 more
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Revisiting the role of oxidation in stable and high-performance lead-free perovskite-IGZO junction field-effect transistors. [PDF]
Kim S +14 more
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Study on the effect of 65 nm NMOS transistor using SILVACO TCAD
Materials Today: Proceedings, 2023Azira Ahmad Tarmizi +5 more
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Organic light emitting diode simulation using Silvaco TCAD tools
2016 International Siberian Conference on Control and Communications (SIBCON), 2016Currently organic light emitting diodes (OLEDs) have become much popular in many spheres of microelectronics including optoelectronic applications, modulated light sources, internet connection etc. The research paper represents the results of two polymer layer organic light emitting diode (OLED) 1D and 2D-numerical simulation and analysis using Silvaco
I. A. Lysenko +2 more
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SILVACO TCAD Implementation of Dual Junction Quantum Well Solar Cell
2020{"references": ["K.W. J Barnham and G. Duggan (1990), \"A new approach to high-efficiency multi-band-gap solar cells\", J. Appl. Phys., Volume 67, Issue 7, ISSN: 0021-8979, Available at: https://doi.org/10.1063/1.345339.", "J. Nelson, M. Paxman, K. W. J. Barnham, J. S. Roberts and C.
Islam, Muhammad Johirul +2 more
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Performance of MOS Capacitor with Different Dielectric Material Simulated Using Silvaco TCAD Tools
Solid State Phenomena, 2023Metal oxide semiconductor (MOS) capacitor is a trilayer device that comprises of metal, dielectric, and semiconductor layer. The advancement of MOS technology has greatly give huge improvement to MOS devices which lead to scaling down the MOS devices.
Lyly Nyl Ismail +2 more
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Study of Strained-SiGe Channel P-MOSFET Using Silvaco TCAD: Impact of Channel Thickness
Key Engineering Materials, 2023Compressively strained SiGe is an interesting channel material for sub 45 nm p-MOSFETs because of its superior hole mobility (up to 10x over bulk Si channels) and compatibility with current Si manufacturing technologies. In this work, the impact of heterostructure composition and SiGe channel thickness on the electrical characteristics of p-MOSFET are ...
Siti NorFarah Nadia Mohd Salleh +5 more
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