Results 71 to 80 of about 1,273 (146)

Effect of Gate Length Scaling on Various Performance Parameters in DG-FinFETs: a Simulation Study [PDF]

open access: yesЖурнал нано- та електронної фізики, 2012
This paper presents a simulation study on the gate length scaling of a double gate (DG) FinFET. To achieve channel lengths smaller than 20 nm, innovative device architectures will be necessary to continue the benefits previously acquired through scaling.
Rakesh Vaid, Meenakshi Chandel
doaj  

Fabrication and Characterization of Stacked Poly-Si Nanosheet With Gate-All-Around and Multi-Gate Junctionless Field Effect Transistors

open access: yesIEEE Journal of the Electron Devices Society, 2019
Present work demonstrates the vertically double stacked nanosheet (NS) p-channel polycrystalline silicon (poly-Si) junctionless field-effect transistors (JL-FET) with tri-gate, omega-gate, and gate all around (GAA) structure.
Meng-Ju Tsai   +7 more
doaj   +1 more source

Steep switching in trimmed-gate tunnel FET

open access: yesAIP Advances, 2018
We propose a tunnel field-effect transistor (TFET) having a trimmed gate (TG) structure, which considerably improves the subthreshold swing (SS). The TG structure truncates the needless long band-to-band tunneling (BTBT) paths to a “channel”, which ...
Hidehiro Asai   +5 more
doaj   +1 more source

Subthreshold Kink Effect in Gate-All-Around MOSFETs Based on Void Embedded Silicon on Insulator Technology

open access: yesIEEE Journal of the Electron Devices Society
The kink effect of gate-all-around (GAA) MOSFET has been experimentally validated by our GAA devices fabricated on a void embedded silicon-on-insulator (VESOI) substrate. In this VESOI GAA device, a consistent and favorable decrease in subthreshold swing
Yuxin Liu   +5 more
doaj   +1 more source

Achieving Near‐Ideal Subthreshold Swing in P‐Type WSe2 Field‐Effect Transistors

open access: yesAdvanced Electronic Materials
The pursuit of near‐ideal subthreshold swing (SS) ≈ 60 mV dec−1 is a primary driving force to realize the power‐efficient field‐effect transistors (FETs).
Fida Ali   +8 more
doaj   +1 more source

Demonstration of SA TG Coplanar IGZO TFTs With Large Subthreshold Swing Using the Back-Gate Biasing Technique for AMOLED Applications

open access: yesIEEE Journal of the Electron Devices Society
We demonstrate that the shorter channel self-aligned top-gate (SA TG) coplanar indiumgallium- zinc oxide (IGZO) thin-film transistors (TFTs), with negative voltage applied to the back-gate, exhibit superior characteristics as driving transistors in ...
Chae-Eun Oh   +9 more
doaj   +1 more source

Influence of polarization coulomb field scattering on the subthreshold swing in E-mode p-GaN/AlGaN/GaN HEMTs

open access: yesJournal of Physics Communications
In the present study, p-GaN/AlGaN/GaN HEMTs treated with hydrogen plasma passivation were fabricated. Capacitance–voltage (C-V) and current–voltage(I-V) characteristics of these devices were subsequently measured.
Heyu Liu   +7 more
doaj   +1 more source

Oxide induced degradation in MoS<sub>2</sub> field-effect transistors. [PDF]

open access: yesNPJ 2D Mater Appl
Ducry F   +5 more
europepmc   +1 more source

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