Results 81 to 90 of about 812 (165)

Fabrication of Wear-Resistant and Anti-Reflection Surfaces Based on Armor-Protected Nanocone Structures. [PDF]

Micromachines (Basel)
Tian H, Chen J, Bi J, Guo H, Lei C, Li R.   +5 more
europepmc   +1 more source

Wet Anisotropic Etching Characteristics of Si{111} in KOH-Based Solution. [PDF]

ACS Omega
Yu X, Ye Y, Zhu P, Wu L, Shen R, Zhu CG.
europepmc   +1 more source

Advanced technologies in InGaN micro-LED fabrication to mitigate the sidewall effect. [PDF]

Light Sci Appl
Liu Z, Cao H, Tang X, Liu T, Lu Y, Jiang Z, Xiao N, Li X.   +7 more
europepmc   +1 more source

Strain-invariant omnidirectional stretchable MXetronics. [PDF]

Nat Commun
Wang S, Deng W, Huang H, Yan Z, Wang Y, Zhou T, Ao Y, Wang Z, Zhang J, Tian G, Lan B, Sun Y, Xu T, Yang T, Huang L, Jin L, Lu J, Yang W.   +17 more
europepmc   +1 more source

Durable Icephobic and Superhydrophobic Silicon Nanowire Surfaces. [PDF]

ACS Appl Mater Interfaces
Mirmohammadi SM, Heikkilä M, Fieber L, Awashra M, Hamed S, Bhusare S, Mohanty G, Ras RHA, Jokinen V, Franssila S.   +9 more
europepmc   +1 more source

Calorimetric differential pressure sensor with high sensitivity for hydrodynamic perception. [PDF]

Microsyst Nanoeng
Cao Y, Ma Z, Kang H, Zhou W, Yang X, Ye H, Zhang X, Cai J, Jiang Y.   +8 more
europepmc   +1 more source

Ultrafast Solid-State Electrochemical Imprinting Utilizing Polymer Electrolyte Membrane Stamps for Static/Dynamic Structural Coloration and Letter Encryption. [PDF]

Small Methods
Yamazaki K, Tsuji A, Takizawa M, Murata J.   +3 more
europepmc   +1 more source

Highly Selective Isotropic Etching of Si to SiGe Using CF₄/O₂/N₂ Plasma for Advanced GAA Nanosheet Transistor. [PDF]

Nanomaterials (Basel)
Li J, Sun X, Huang Z, Zhang DW.
europepmc   +1 more source

Dual-mode CMUT structure sensor for high hydrostatic pressure measurements: conventional and collapse modes. [PDF]

Microsyst Nanoeng
Li Z, Zhang W, Yilmaz M, Liu G, Zhang G, Qin L, Wang R.   +6 more
europepmc   +1 more source