Results 91 to 100 of about 182 (116)
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Capacitively coupled transmission line pulsing cc-TLP––a traceable and reproducible stress method in the CDM-domain

Microelectronics Reliability, 2005
This paper describes a new test method called capacitively coupled transmission line pulsing cc-TLP. It is applied to different test circuits which were mounted on specially designed package emulators with a defined background capacitance. The test results are compared with the ESD thresholds obtained by CDM tests.
Heinrich Wolf   +3 more
openaire   +1 more source

Microanalysis and electromigration reliability performance of high current transmission line pulse (TLP) stressed copper interconnects

Microelectronics Reliability, 2003
Abstract Electrostatic discharge events can degrade the electromigration (EM) reliability of devices. Transmission line pulsing stress analysis is used to evaluate electrostatic discharge robustness of copper (Cu) interconnects and the impact to EM performance.
Sherry Suat Cheng Khoo   +2 more
openaire   +1 more source

Investigation on the Validity of Holding Voltage in High-Voltage Devices Measured by Transmission-Line-Pulsing (TLP)

IEEE Electron Device Letters, 2008
Latch-up is one of the most critical issues in high-voltage (HV) ICs due to the high power-supply voltages. Because the breakdown junction of an HV device is easily damaged by the huge power generated from a DC curve tracer, the device immunity against latch-up is often referred to the transmission-line-pulsing (TLP)-measured holding voltage.
Wen-Yi Chen, Ming-Dou Ker, Yeh-Jen Huang
openaire   +1 more source

Evaluation on ESD robustness of LTPS diode and TFT device by transmission line pulsing (TLP) technique

2003 International Symposium on VLSI Technology, Systems and Applications. Proceedings of Technical Papers. (IEEE Cat. No.03TH8672), 2004
ESD robustness of Low Temperature Poly-Si (LTPS) diodes and TFT devices has been investigated in this paper. By using the Transmission Line Pulsing (TLP) techniques, the It2 (secondary breakdown current) of LTPS diodes and TFT devices were measured. To evaluate the ESD robustness of components for ESD protection, the shifts of breakdown voltage and cut-
null Ming-Dou Ker   +4 more
openaire   +1 more source

High current characteristics of copper interconnect under transmission-line pulse (TLP) stress and ESD zapping

2004 IEEE International Reliability Physics Symposium. Proceedings, 2004
The Cu metal interconnect under TLP stress can not be treated as the constant current stress. The increase in the metal interconnect length at GGNMOS drain can improve device's MM failure threshold but degrade device's HBM failure threshold and IT2.
J.H. Lee   +7 more
openaire   +1 more source

An improved transmission line pulsing (TLP) setup for electrostatic discharge (ESD) testing in semiconductor devices and ICs

ICMTS 2001. Proceedings of the 2001 International Conference on Microelectronic Test Structures (Cat. No.01CH37153), 2002
Transmission line pulsing (TLP) is a useful technique to characterize electrostatic discharge (ESD) events in semiconductor devices. The pulse waveforms generated by a typical TLP set-up, however, are often distorted and oscillatory. In this paper, a new and simple experimental set-up is developed to improve the shape of the TLP waveforms and thus to ...
J.C. Lee   +4 more
openaire   +1 more source

Correlation limits between capacitively coupled transmission line pulsing (CC-TLP) and CDM for a large chip-on-flex assembly

2017 39th Electrical Overstress/Electrostatic Discharge Symposium (EOS/ESD), 2017
For the first time this correlation study compares air discharge CDM and contact-mode Capacitively Coupled Transmission Line Pulsing (CC-TLP) for a large chip-on-flex assembly e.g. for the Internet of Things (IOT) applications. Both ground planes overlap only part of the flexible substrate with long traces.
Johannes Weber   +4 more
openaire   +1 more source

High current transmission line pulse (TLP) and ESD characterization of a silicon germanium heterojunction bipolar transistor with carbon incorporation

2002 IEEE International Reliability Physics Symposium. Proceedings. 40th Annual (Cat. No.02CH37320), 2003
Electrostatic discharge robustness of an epitaxial-base pseudomorphic Silicon Germanium Heterojunction Bipolar Transistor (HBT) device with Carbon incorporation is shown for the first time. Experimental results show that incorporation of Carbon in the base of a SiGe HBT device improves power-to-failure variation by improved control of the base width ...
B. Ronan   +5 more
openaire   +1 more source

Transmission line pulse (TLP) testing of radio frequency (RF) micro-machined micro-electromechanical systems (MEMS) switches

2006
Radio frequency micro-electromechanical (RF-MEM) switches, both ohmic and capacitive, are important for future RF wired and wireless communication systems. In this paper, transmission line pulse testing and ESD characterization is shown for the first time.
TAZZOLI, AUGUSTO   +3 more
openaire   +1 more source

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