Results 61 to 70 of about 341 (156)

System calibration method for Silicon wafer warpage measurement

open access: yesJournal of the Korean Society of Manufacturing Process Engineers, 2014
ABSTRACT As a result of a mismatch of the residual stress between both sides of the silicon wafer, which warps and distorts during the patterning process. The accuracy of the warpage measurement is related to the calibration. A CCD camera was used for the calibration.
openaire   +2 more sources

A Review of Polymer Dielectrics for Redistribution Layers in Interposers and Package Substrates. [PDF]

open access: yesPolymers (Basel), 2023
Nimbalkar P   +4 more
europepmc   +1 more source

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