Results 271 to 280 of about 140,062 (302)
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2013
One of the major challenges that technology evolution has been facing in the last few years is the increasing severity of variability associated with the discrete nature of charge and the atomicity of matter, which become relevant in aggressively scaled devices.
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One of the major challenges that technology evolution has been facing in the last few years is the increasing severity of variability associated with the discrete nature of charge and the atomicity of matter, which become relevant in aggressively scaled devices.
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Japanese Journal of Applied Physics, 2014
Influence of work function variation (WFV) in metal gates (MGs) on fluctuation of sub-threshold drain current is investigated in detail by analyzing fluctuation of current–onset voltage (COV) for fin field-effect transistors (FinFETs) with polycrystalline TiN and amorphous TaSiN MGs.
Takashi Matsukawa +11 more
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Influence of work function variation (WFV) in metal gates (MGs) on fluctuation of sub-threshold drain current is investigated in detail by analyzing fluctuation of current–onset voltage (COV) for fin field-effect transistors (FinFETs) with polycrystalline TiN and amorphous TaSiN MGs.
Takashi Matsukawa +11 more
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2010 14th International Workshop on Computational Electronics, 2010
Random work-function (WK) induced threshold voltage fluctuation (σV th ) in 16-nm TiN metal-gate fin-type field effect transistors (FinFETs) is explored and modeled by using an experimentally validated Monte Carlo simulation approach. The influences of metal-grain size and device geometry aspect ratio on the random WK-induced σV th are studied ...
Hui-Wen Cheng, Yiming Li
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Random work-function (WK) induced threshold voltage fluctuation (σV th ) in 16-nm TiN metal-gate fin-type field effect transistors (FinFETs) is explored and modeled by using an experimentally validated Monte Carlo simulation approach. The influences of metal-grain size and device geometry aspect ratio on the random WK-induced σV th are studied ...
Hui-Wen Cheng, Yiming Li
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Impact on Radiation Robustness of Gate Mapping in FinFET Circuits under Work-function Fluctuation
2023 IEEE International Symposium on Circuits and Systems (ISCAS), 2023Bernardo Borges Sandoval +6 more
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Significance of Work Function Fluctuations in SiGe/Si Hetero-Nanosheet Tunnel-FET at Sub-3 nm Nodes
IEEE Transactions on Electron Devices, 2022Narasimhulu Thoti +2 more
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2022 6th IEEE Electron Devices Technology & Manufacturing Conference (EDTM), 2022
Rajat Butola +2 more
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Rajat Butola +2 more
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2022 IEEE 22nd International Conference on Nanotechnology (NANO), 2022
Chandni Akbar, Yiming Li, Wen-Li Sung
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Chandni Akbar, Yiming Li, Wen-Li Sung
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