Results 131 to 140 of about 240,009 (234)

4H-SiC同质外延层中的扩展缺陷研究

open access: yes, 2011
利用自主研发的热壁低压化学气相沉积(HWLPCVD)系统,在5.08 cm(2英寸)4°偏轴4H-SiC衬底上生长4H-SiC同质外延膜。讨论了4H-SiC同质外延层中的两种扩展缺陷---彗星缺陷和胡萝卜缺陷,研究了这两种缺陷的起源与消除方法。研究发现采用化学机械抛光(CMP)方法可以有效去除扩展缺陷,提高外延膜的质量。另外 ...
王雷   +8 more
core  

Deuxième séance du SIC "Santé, exclusion, citoyenneté", Lille, 17 avril 2015

open access: yes, 2015
Le vendredi 17 avril prochain aura lieu la deuxième séance du SIC. Elle se déroulera à l'Université de Lille 3 dans la salle de séminaire de l'IRHiS de 13h15 à 17h45. Le programme est disponible ici: Programme Séminaire SIC 17 avril 2015. Cette séance se
sic
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>10kV 4H-SiC n-IGBTs for elevated temperature environments

open access: yes
In this work we explore the appropriate design parameters which will enable the fabrication of a >10kVn-Channel IGBT. In particular, we emphasize the reduction of device blocking capabilities for high temperature environments.
Tiwari, Amit K.   +6 more
core  

Homoepitaxial growth and characterization of 4H-SiC epilayers by low-pressure hot-wall chemical vapor deposition

open access: yes, 2006
Horizontal air-cooled low-pressure hot-wall CVD (LP-HWCVD) system is developed to get high quality 4H-SiC epilayers. Homoepitaxial growth of 4H-SiC on off-oriented Si-face (0001) 4H-SiC substrates purchased from Cree is performed at a typical temperature
Ning, J (Ning, Jin)   +8 more
core  

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