Results 111 to 120 of about 240,009 (234)
Electrical properties and electroluminescence of 4H-SiC p-n junction diodes
Homoepitaxial growth of 4H-SiC on off-oriented Si-face(0001) substrates was performed by using the step-controlled epitaxy technique in a newly developed low-pressure hot-wall CVD (LP-HWCVD) system with a horizontal air-cooled quartz tube at around 1500 ...
Sun, GS, Chinese Acad Sci, Inst Semicond, Novel Semicond Mat Lab, Beijing 100083, Peoples R China. 电子邮箱地址: gshsun@red.semi.ac.cn +7 more
core
TCAD simulations of radiation damage in 4H-SiC
4 pages, 4 ...
Burin, Jürgen +5 more
openaire +2 more sources
High-index 4H-silicon carbide (4H-SiC) provides a larger waveguide k-space than conventional glass and is therefore attractive for wide field-of-view (FOV) diffractive augmented reality waveguides.
Shiyang Hou +5 more
doaj +1 more source
Silicon carbide (SiC) has become one of the most promising materials in the field of power semiconductors in the last 20 years. Among the SiC polytypes, 4H-SiC is considered the suitable polytype for power electronic applications due to its large bandgap,
Xu, M +11 more
core +1 more source
4H-SiC is a pivotal semiconductor for high-power, high-temperature devices, where Auger recombination significantly affects performance under high carrier injection. While previously studied in lightly doped material, data for heavily doped n-type 4H-SiC
Endong Zhang +2 more
doaj +1 more source
Horizontal air-cooled low-pressure hot-wall CVD (LP-HWCVD) system is developed to get highly qualitical 4H-SiC epilayers.Homoepitaxial growth of 4H-SiC on off-oriented Si-face (0001) 4H-SiC substrates is performed at 1500℃ with a pressure of 1.3×103Pa by
Wang Lei +6 more
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Characteristics and behaviors analysis of etch pits in 4H-SiC epilayers by molten KOH etching
The etch rates of molten-alkali etching fluctuates among different types of 4H-SiC epilayers, due to Fermi levels variations. This inconsistency makes it challenging to identify dislocations based solely on etch pit shapes and sizes.
Xu, M +7 more
core +1 more source
Première séance du séminaire SIC, Université Lille 3, 27 mars 2015
La première séance du séminaire SIC aura lieu le 27 mars 2015 de 9h30 à 17h45 à l'Université de Lille 3 (Campus Sciences humaines et sociales) dans la salle de séminaire de l'IRHiS (des panneaux vous indiqueront le chemin).
sic
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4H-SiC-based metal-insulator-semiconductor (MIS) ultraviolet (UV) photodetectors with thermally grown SiO2 and evaporated Al2O3/SiO2 (A/S) films are fabricated and demonstrated as normally-off and normally-on mode devices, respectively.
Zhengyun Wu +23 more
core
Insights into ALD Growth of Al-Based Dielectric Stack on 4H-SiC. [PDF]
Galizia B +7 more
europepmc +1 more source

