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AFM and XPS studies on material removal mechanism of sapphire wafer during chemical mechanical polishing (CMP)

Journal of materials science. Materials in electronics, 2015
Yan Zhou   +5 more
semanticscholar   +1 more source

DEVELOPMENT OF AN INTELLIGENT CHEMICAL-MECHANICAL POLISHING (CMP) SYSTEM

Abrasive Technology, 1999
Y. SAMITSU   +5 more
openaire   +1 more source

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