Prediction Model and Experimental Verification of Surface Roughness of Single Crystal Diamond Chemical Mechanical Polishing Based on Archimedes Optimization Algorithm. [PDF]
Li Z +5 more
europepmc +1 more source
Consideration of Pad Conditioning in CMP(Chemical–Mechanical Polishing)
Kamikawa, Daichi +2 more
openaire +1 more source
Effects of Hydrolysis Reaction and Abrasive Drag Force Accelerator on Enhancing Si-Wafer Polishing Rate and Improving Si-Wafer Surface Roughness. [PDF]
Jeon MU +9 more
europepmc +1 more source
PFC Simulation and Experimental Investigation of Crack Evolution and Surface Morphology in Rehbinder-Effect-Assisted Longitudinal-Torsional Ultrasonic Vibration Milling of Borosilicate Glass. [PDF]
Yi J +5 more
europepmc +1 more source
Material Removal Mechanism and Performance Evaluation of Focused Ultrasonic-Assisted Abrasive Waterjet Polishing (FUAP) of Monocrystalline Silicon. [PDF]
Ren K +6 more
europepmc +1 more source
Wafer-Level Transfer of GaN-on-Si Light-Emitting Devices via SiO<sub>2</sub>-SiO<sub>2</sub> Direct Bonding: Strain Evolution and Optoelectronic Performance. [PDF]
Zhang S, Zhang S, Fan Q, Ni X, Gu X.
europepmc +1 more source
Controllable Synthesis of Monodisperse CeO<sub>2</sub> Nanoparticles with Tunable Sizes for Chemical-Mechanical Polishing. [PDF]
Ma Y +6 more
europepmc +1 more source
Dual-Functional Metal Interlayer Enables High-Quality GaN Epitaxy and Low-Damage Transfer Towards Flexible Optoelectronics. [PDF]
Ma Y +5 more
europepmc +1 more source
Magnetorheological Finishing Technology: Research Progress in Materials, Mechanisms, Equipment, and Intelligentization. [PDF]
Ding L, Song G, Gao G, Shi D.
europepmc +1 more source
Study on polishing mechanisms of BEOL metal interconnects based on chemical and mechanical synergy. [PDF]
Tian Z +5 more
europepmc +1 more source

