A contamination-free and low-leakage-current Cu-TSV technology enabled by engineered double-sided processing. [PDF]
Hao Y +6 more
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Investigation the CMP process of 6 H-SiC in H2O2 solution with ReaxFF molecular dynamics simulation. [PDF]
Gu Y +5 more
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Study on the Effect of Substitutional Doping of Ce Atomic on the Damage Properties of Fused Silica. [PDF]
Chen J, Ni K, Hong R, Li L, Sui Z.
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Study on Self-Sharpening Mechanism and Polishing Performance of Triethylamine Alcohol on Gel Polishing Discs. [PDF]
Lei Y, Xu L, Feng K.
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Study on the Electro-Fenton Chemomechanical Removal Behavior in Single-Crystal GaN Pin-Disk Friction Wear Experiments. [PDF]
Ou Y, Shen Z, Xie J, Pan J.
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Tribo-Electrochemical Mechanism of Material Removal Examined for Chemical Mechanical Planarization of Stainless-Steel Using Citrate Buffer as a Complexing Agent. [PDF]
Santefort DR, Gamagedara KU, Roy D.
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Comprehensive Structural and Interfacial Characterization of Laser-Sliced SiC Wafers. [PDF]
Chen H +6 more
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Probing the Nanoscale Onset of Plasticity in Electroplated Copper for Hybrid Bonding Structures via Multimodal Atomic Force Microscopy. [PDF]
Alderete NA +3 more
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Research on Deflection and Stress Analyses and the Improvement of the Removal Uniformity of Silicon in a Single-Sided Polishing Machine Under Pressure. [PDF]
Ye G, Yao Z.
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