Results 151 to 160 of about 1,061 (174)

DEVELOPMENT OF AN INTELLIGENT CHEMICAL-MECHANICAL POLISHING (CMP) SYSTEM

Abrasive Technology, 1999
Y. SAMITSU, K. KOBAYASHI, E. YAMAMOTO, E. KERBA, Y. HAYASHI, T. ONODERA   +5 more
openaire   +1 more source

Systematic Yield - Chemical Mechanical Polishing (CMP)

2007
Charles C. Chiang, Jamil Kawa
openaire   +1 more source

Polishing Technique and CMP (Chemical & Mechanical Polishing) in Semiconductor Process

Journal of the Society of Mechanical Engineers, 2000
openaire   +1 more source

Contact Behavior and Chemical Mechanical Polishing (CMP) Performance of Hole-Type Polishing Pad

ECS Journal of Solid State Science and Technology, 2012
Hong Jin Kim, Jae Kwang Choi, Myung Ki Hong, Kuntack Lee, Yongsun Ko   +4 more
openaire   +1 more source

Semi-empirical material removal rate distribution model for SiO2 chemical mechanical polishing (CMP) processes

Precision Engineering, 2013
Hyunseop Lee, H D Jeong, D A Dornfeld
exaly  

CMP – Chemical-Mechanical Polishing

2013
openaire   +1 more source

Effects of the ultrasonic flexural vibration on the interaction between the abrasive particles; pad and sapphire substrate during chemical mechanical polishing (CMP)

Applied Surface Science, 2011
Wenhu Xu, Xinchun Lu, Guoshun Pan
exaly  

Chemical and physical mechanisms of dielectric chemical mechanical polishing (CMP)

2016
openaire   +1 more source

XPS, UV–vis spectroscopy and AFM studies on removal mechanisms of Si-face SiC wafer chemical mechanical polishing (CMP)

Applied Surface Science, 2014
Guoshun Pan, Xiaolei Shi, Chunli Zou
exaly  

Nd 3+ -doped colloidal SiO 2 composite abrasives: Synthesis and the effects on chemical mechanical polishing (CMP) performances of sapphire wafers

Applied Surface Science, 2017
Hong Lei
exaly