Results 161 to 170 of about 1,061 (174)
Some of the next articles are maybe not open access.

Chemical evidences for the optimal coagulant dosage and pH adjustment of silica removal from chemical mechanical polishing (CMP) wastewater

Colloids and Surfaces A: Physicochemical and Engineering Aspects, 2009
Wen-Hui Kuan, Ching-Yao Hu
exaly  

Chemical mechanical polishing (CMP) of SiC wafer utilizing catalyst in slurry

2014
Zhou, Yan   +5 more
openaire   +1 more source

Home - About - Disclaimer - Privacy