Results 181 to 190 of about 6,173 (209)
Some of the next articles are maybe not open access.

Contact Behavior and Chemical Mechanical Polishing (CMP) Performance of Hole-Type Polishing Pad

ECS Journal of Solid State Science and Technology, 2012
Hong Jin Kim   +4 more
openaire   +1 more source

Process Optimization on Chemical Mechanical Polishing (CMP) for Alleviating the Post-polishing Substrate-platen Adhesion

This study addresses a common problem in disk production where disks stick to machines after polishing. The research identifies key factors that reduce this sticking issue and improve product quality. The study reveals that polishing surface speed significantly influences disk adhesion.
openaire   +1 more source

Study on high efficient sapphire wafer processing by coupling SG-mechanical polishing and GLA-CMP

International Journal of Machine Tools and Manufacture, 2018
Yongchao Xu, Jing Lu
exaly  

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