Results 181 to 190 of about 7,532,110 (199)
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Chemical evidences for the optimal coagulant dosage and pH adjustment of silica removal from chemical mechanical polishing (CMP) wastewater

Colloids and Surfaces A: Physicochemical and Engineering Aspects, 2009
Ching-Yao Hu, Wen-Hui Kuan
exaly  

Chemical mechanical polishing (CMP) composition comprising a specific heteropolyacid

2014
SCHMITT CHRISTINE   +4 more
openaire   +2 more sources

OXIDE CHEMICAL MECHANICAL PLANARIZATION (CMP) POLISHING COMPOSITIONS

2020
SHI XIAOBO   +4 more
openaire   +1 more source

Locally tailoring chemical mechanical polishing (CMP) polish rate for dielectrics

2014
AMOAH YOBA   +4 more
openaire   +1 more source

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