Results 181 to 190 of about 6,173 (209)
Some of the next articles are maybe not open access.
Contact Behavior and Chemical Mechanical Polishing (CMP) Performance of Hole-Type Polishing Pad
ECS Journal of Solid State Science and Technology, 2012Hong Jin Kim +4 more
openaire +1 more source
This study addresses a common problem in disk production where disks stick to machines after polishing. The research identifies key factors that reduce this sticking issue and improve product quality. The study reveals that polishing surface speed significantly influences disk adhesion.
openaire +1 more source
openaire +1 more source
Polishing Technique and CMP (Chemical & Mechanical Polishing) in Semiconductor Process
Journal of the Society of Mechanical Engineers, 2000openaire +1 more source
Study on high efficient sapphire wafer processing by coupling SG-mechanical polishing and GLA-CMP
International Journal of Machine Tools and Manufacture, 2018Yongchao Xu, Jing Lu
exaly
Chemical and physical mechanisms of dielectric chemical mechanical polishing (CMP)
2016openaire +1 more source

