Results 171 to 180 of about 7,532,110 (199)

Semi-empirical material removal rate distribution model for SiO chemical mechanical polishing (CMP) processes

Precision Engineering, 2013
H D Jeong, D A Dornfeld, H S Lee
exaly  

CMP – Chemical-Mechanical Polishing

2013
openaire   +1 more source

Effects of the ultrasonic flexural vibration on the interaction between the abrasive particles; pad and sapphire substrate during chemical mechanical polishing (CMP)

Applied Surface Science, 2011
Jianbin Luo, Wenhu Xu
exaly  

Chemical and physical mechanisms of dielectric chemical mechanical polishing (CMP)

2016
openaire   +1 more source

Nd-doped colloidal SiO composite abrasives: Synthesis and the effects on chemical mechanical polishing (CMP) performances of sapphire wafers

Applied Surface Science, 2017
Hong Lei
exaly  

Chemical Mechanical Polishing (CMP) of Cobalt-Containing Substrate

2016
SHI XIAOBO, JAMES ALLEN SCHLUETER, MARC O'NEAL LEONARD   +2 more
openaire   +4 more sources

Preparation of silane modified SiO2 abrasive particles and their Chemical Mechanical Polishing (CMP) performances

Wear, 2011
Hua Gong
exaly  

Contact Behavior and Chemical Mechanical Polishing (CMP) Performance of Hole-Type Polishing Pad

ECS Journal of Solid State Science and Technology, 2012
Hong Jin Kim, Jae Kwang Choi, Myung Ki Hong, Kuntack Lee, Yongsun Ko   +4 more
openaire   +1 more source

Chemical Mechanical Polishing (CMP) of Cobalt-Containing substrate

2017
SHI XIAOBO, ROSE JOSEPH, CLORE TIMOTHY JOSEPH, SCHLUETER JAMES ALLEN, GRIEF MALCOLM, O'NEILL MARK LEONARD   +5 more
openaire   +2 more sources

Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substrates

2021
REICHARDT ROBERT, SIEBERT MAX, LAN YONGQING, LAUTER MICHAEL, USMAN IBRAHIM SHEIK ANSAR, GOLZARIAN REZA M, WEI TE YU, GUEVENC HACI OSMAN, PROELSS JULIAN, LEUNISSEN LEONARDUS   +9 more
openaire   +1 more source