Results 251 to 260 of about 537,942 (300)

Micromachined microwave transmission lines by commercial CMOS fabrication

Proceedings of the 39th Midwest Symposium on Circuits and Systems, 2002
Coplanar waveguides were designed and fabricated in standard CMOS with post-processing micromachining. Transmission line layouts were designed with commercial CAD tools, ICs were fabricated through a commercial CMOS foundry, and subsequently suspended by maskless top-side etching.
V. Milanovic, M. Gaitan, E.D. Bowen, M.E. Zaghloul   +3 more
openaire   +1 more source

Micromachined thermocouple microwave detector by commercial CMOS fabrication

IEEE Transactions on Microwave Theory and Techniques, 1998
This paper reports on the design and testing of a thermocouple microwave detector fabricated through a commercial CMOS foundry with an additional maskless etching procedure. The detector measures true r.m.s. power of signals in the frequency range from 50 MHz to 20 GHz, and input power range from -30 to +10 dBm, the device has linearity better than ...
V. Milanovic, M. Gaitan, M.E. Zaghloul
openaire   +1 more source

Towards a framework for designing applications onto hybrid nano/CMOS fabrics

Microelectronics Journal, 2009
The design of CAD tools for nanofabrics involves new challenges not encountered with conventional design flow used for CMOS technology. In this paper, we propose to define a new framework able to help the designer to map an application on a wide range of emerging nanofabrics.
Catherine Dezan, Ciprian Teodorov, Loïc Lagadec, Michael Leuchtenburg, Teng Wang, Pritish Narayanan, Csaba Andras Moritz   +6 more
openaire   +2 more sources

NWELL CMOS fabrication process for the Virginia Microelectronics Center

Proceedings of the Fourteenth Biennial University/Government/Industry Microelectronics Symposium (Cat. No.01CH37197), 2002
The VMC is developing a CMOS process to help teach microelectronics students the techniques of semiconductor fabrication. It is also intended to be a vehicle for the implementation of VLSI digital and analog circuit designs at VCU. The development of the CMOS process is an on-going senior electrical engineering project.
N.R. Balderson, G. Cordova, null Kwang Yi, A. Guliani, S. Manek, G.W. Schiavone, J. Harrison, R.E. Pearson   +7 more
openaire   +1 more source

Commercial CMOS fabricated integrated dynamic thermal scene simulator

International Electron Devices Meeting 1991 [Technical Digest], 2002
The authors report a prototype integrated dynamic thermal scene simulator chip, consisting of a 2*2 array of integrated thermal pixels. The chips were fabricated using commercial CMOS processes. The micromachining process needed to create the thermally isolated structure is introduced as a maskless postprocessing step. The thermal pixel and the control
M. Parameswaran, R. Chung, M. Gaitan, R.B. Johnson, M. Syrzycki   +4 more
openaire   +1 more source

Modeling and Characterization of CMOS-Fabricated Capacitive Micromachined Ultrasound Transducers

Journal of Microelectromechanical Systems, 2011
This paper describes the fabrication, characterization, and modeling of complementary metal-oxide-semiconductor (CMOS)-compatible capacitive micromachined ultrasound transducers (CMUTs). The transducers are fabricated using the interconnect and dielectric layers from a standard CMOS fabrication process.
Christopher B. Doody, Xiaoyang Cheng, Collin A. Rich, David F. Lemmerhirt, Robert D. White   +4 more
openaire   +1 more source

Thermoelectric power sensor for microwave applications by commercial CMOS fabrication

IEEE Electron Device Letters, 1997
This work describes an implementation of a thermoelectric microwave power sensor fabricated through commercial CMOS process with additional maskless etching. The sensor combines micromachined coplanar waveguide and contact pads, a microwave termination which dissipates heat proportionally to input microwave power, and many aluminum-polysilicon ...
V. Milanovic, M. Gaitan, E.D. Bowen, N.H. Tea, M.E. Zaghloul   +4 more
openaire   +1 more source

An object-oriented design paradigm for standard CMOS fabrication technology

Proceedings of the 12th IEEE International Conference on Fuzzy Systems (Cat. No.03CH37442), 2003
The object-oriented design methodology has been manipulated to model the standard CMOS fabrication technology. Detecting and characterizing the objects and classes within the basic object-oriented features of encapsulation, inheritance and polymorphism, as well as discussing the model framework and model characterization has been the main pursuits of ...
B. Hekmatshoar, C. Lucas
openaire   +1 more source

CMOS Fabricated, Piezoelectrically Tunable Silicon Cavity Optomechanics

CLEO 2026
We demonstrate a high-volume CMOS foundry fabricated, piezoelectrically actuated, slotted W1 photonic crystal cavity with optical resonance tuning of 3.87 THz using 40V bias, increasing the optomechanical coupling rate from 160 GHz/nm to 500 GHz/nm.
Johnathan T. Mack, Matthew J. Storey, Alexandria Miera, Andrew Starbuck, Andrew Leenheer, Douglas Trotter, Nils T. Otterstrom, Matt Eichenfield   +7 more
openaire   +1 more source

Ternary volatile random access memory based on heterogeneous graphene-CMOS fabric

Proceedings of the 2012 IEEE/ACM International Symposium on Nanoscale Architectures, 2012
Graphene is an emerging nano-material that has garnered immense research interest due to its exotic electrical properties. It is believed to be a potential candidate for post-Si nanoelectronics due to high carrier mobility and extreme scalability.
Santosh Khasanvis, K. M. Masum Habib, Mostafizur Rahman, Pritish Narayanan, Roger K. Lake, Csaba Andras Moritz   +5 more
openaire   +1 more source