Results 1 to 10 of about 17,122 (236)

Metasurface Fabrication by Cryogenic and Bosch Deep Reactive Ion Etching [PDF]

Micromachines, 2021
The research field of metasurfaces has attracted considerable attention in recent years due to its high potential to achieve flat, ultrathin optical devices of high performance. Metasurfaces, consisting of artificial patterns of subwavelength dimensions,
Angela M Baracu, Christopher A Dirdal, Andrei Marius Avram   +2 more
exaly   +6 more sources

Cryogenic Etching of High Aspect Ratio 400-nm Pitch Silicon Gratings [PDF]

Journal of Microelectromechanical Systems, 2016
The cryogenic process and Bosch process are two widely used processes for reactive ion etching of high aspect ratio silicon structures. This paper focuses on the cryogenic deep etching of 400 nm pitch silicon gratings with various etching mask materials including polymer, Cr, SiO2 and Cr-on-polymer.
Houxun Miao, Han Wen
exaly   +5 more sources

Study of Cryogenic Unmasked Etching of “Black Silicon” with Ar Gas Additives [PDF]

ACS Omega, 2022
The influence of Ar gas additives on ≪black silicon≫ formation is shown in this work. The way to achieve the conical shape of Si texture using low Ar dilution is demonstrated. Also, a possibility of silicon nanowire width reduction keeping a high density of array is shown. No damage to the Si structure caused by Ar plasma was detected. The introduction
Ekaterina A. Vyacheslavova, Ivan A. Morozov, Dmitri A. Kudryashov, Alexander V. Uvarov, Artem I. Baranov, Alina A. Maksimova, Sergey N. Abolmasov, Alexander S. Gudovskikh   +7 more
doaj   +3 more sources

In Situ Growth, Etching, and Charging of Nanoscale Water Ice Under Fast Electron Irradiation in Environmental TEM [PDF]

Nanomaterials
Understanding the formation, structural evolution, and response of water ice at the nanoscale is essential for advancing research in fields such as cryo-electron microscopy and atmospheric science.
Hongchen Chu, Qianming An, Xianhui Ye, Duanzheng Wu, Binye Liang, Jiaqi Su, Zian Li   +6 more
doaj   +2 more sources

Cryogenic Electron Beam Induced Chemical Etching [PDF]

ACS Applied Materials & Interfaces, 2014
Cryogenic cooling is used to enable efficient, gas-mediated electron beam induced etching (EBIE) in cases where the etch rate is negligible at room and elevated substrate temperatures. The process is demonstrated using nitrogen trifluoride (NF3) as the etch precursor, and Si, SiO2, SiC, and Si3N4 as the materials volatilized by an electron beam ...
Aiden A Martin, Milos Toth
exaly   +3 more sources

High aspect ratio etched sub-micron structures in silicon obtained by cryogenic plasma deep-etching through perforated polymer thin films

Micro and Nano Engineering, 2018
Cryogenic plasma deep-etching for silicon sub-micron structures was studied with the use of modified poly(styrene) (PS) perforated masks obtained from laterally phase separated PS and poly (lactic acid) PLA blend thin films.
Rémi Dussart
exaly   +3 more sources

Universal cryogenic transfer of liquid metal particles in polymers for wafer-scale stretchable integrated electronics [PDF]

Nature Communications
Gallium-based liquid metals (LMs) are promising materials for stretchable electronics due to their metallic conductivity and deformability. However, the fabrication of large-area stretchable integrated electronics using LMs on various polymers remains ...
Do Hoon Lee, Seungkyu Lee, Minyong Park, Junehyeok Kim, Hanbit Jin, Su Yeong Kim, Donghyun Lee, Young-Soo Lim, Jun Chang Yang, Taehoon Lee, Byungkook Oh, Sang Yu Sun, Do-Wan Kim, Sihong Wang, Sung Gap Im, Hye Jin Kim, Sung-Min Park, Jihan Kim, Yang-Kyu Choi, Steve Park   +19 more
doaj   +2 more sources

Guidelines for etching silicon MEMS structures using fluorine high-density plasmas at cryogenic temperatures [PDF]

Journal of Microelectromechanical Systems, 2002
This paper presents guidelines for the deep reactive ion etching (DRIE) of silicon MEMS structures, employing SF/sub 6//O/sub 2/-based high-density plasmas at cryogenic temperatures.
Mj De Boer, Han J G E Gardeniers, Hv Jansen   +2 more
exaly   +4 more sources

Optimization of Soft X-Ray Fresnel Zone Plate Fabrication Through Joint Electron Beam Lithography and Cryo-Etching Techniques [PDF]

Nanomaterials
The ability to manufacture complex 3D structures with nanometer-scale resolution, such as Fresnel Zone Plates (FZPs), is crucial to achieve state-of-the-art control in X-ray sources for use in a diverse range of cutting-edge applications.
Maha Labani, Vito Clericò, Enrique Diez, Giancarlo Gatti, Mario Amado, Ana Pérez-Rodríguez   +5 more
doaj   +2 more sources

Quantum circuits with SINIS structures [PDF]

Beilstein Journal of Nanotechnology
The superconductor–insulator–normal metal–insulator–superconductor (SINIS) tunnel junction structure is the basic building block for various cryogenic devices. Microwave detectors, electron coolers, primary thermometers, and Aharonov–Bohm interferometers
Mikhail Tarasov, Mikhail Fominskii, Aleksandra Gunbina, Artem Krasilnikov, Maria Mansfeld, Dmitrii Kukushkin, Andrei Maruhno, Valeria Ievleva, Mikhail Strelkov, Daniil Zhogov, Konstantin Arutyunov, Vyacheslav Vdovin, Vladislav Stolyarov, Valerian Edelman   +13 more
doaj   +2 more sources