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Metasurface Fabrication by Cryogenic and Bosch Deep Reactive Ion Etching [PDF]

open access: yesMicromachines, 2021
The research field of metasurfaces has attracted considerable attention in recent years due to its high potential to achieve flat, ultrathin optical devices of high performance. Metasurfaces, consisting of artificial patterns of subwavelength dimensions,
Angela Baracu   +2 more
exaly   +8 more sources

Cryogenic Electron Beam Induced Chemical Etching [PDF]

open access: yesACS Applied Materials & Interfaces, 2014
Cryogenic cooling is used to enable efficient, gas-mediated electron beam induced etching (EBIE) in cases where the etch rate is negligible at room and elevated substrate temperatures. The process is demonstrated using nitrogen trifluoride (NF3) as the etch precursor, and Si, SiO2, SiC, and Si3N4 as the materials volatilized by an electron beam ...
Aiden A Martin, Miloš Tóth
exaly   +4 more sources

High aspect ratio etched sub-micron structures in silicon obtained by cryogenic plasma deep-etching through perforated polymer thin films

open access: yesMicro and Nano Engineering, 2018
Cryogenic plasma deep-etching for silicon sub-micron structures was studied with the use of modified poly(styrene) (PS) perforated masks obtained from laterally phase separated PS and poly (lactic acid) PLA blend thin films.
T Tillocher, R Dussart
exaly   +4 more sources

Cryogenic Etching of High Aspect Ratio 400-nm Pitch Silicon Gratings [PDF]

open access: yesJournal of Microelectromechanical Systems, 2016
The cryogenic process and Bosch process are two widely used processes for reactive ion etching of high aspect ratio silicon structures. This paper focuses on the cryogenic deep etching of 400 nm pitch silicon gratings with various etching mask materials including polymer, Cr, SiO2 and Cr-on-polymer.
Houxun Miao, Han Wen, Houxun Miao
exaly   +5 more sources

Atomic Force Microscopy (AFM)-Based Metrology for Advanced Etching in Three-Dimensional Integrated Circuits [PDF]

open access: yesMicromachines
Fueled by the push for “More than Moore”, three-dimensional integrated circuits (3D ICs) have become a backbone of next-generation electronics. Their complex architectures place unprecedented demands on etching technologies, which must now deliver atomic
Jing Chang   +4 more
doaj   +2 more sources

Study of Cryogenic Unmasked Etching of “Black Silicon” with Ar Gas Additives [PDF]

open access: yesACS Omega, 2022
The influence of Ar gas additives on ≪black silicon≫ formation is shown in this work. The way to achieve the conical shape of Si texture using low Ar dilution is demonstrated. Also, a possibility of silicon nanowire width reduction keeping a high density of array is shown. No damage to the Si structure caused by Ar plasma was detected. The introduction
Ekaterina A. Vyacheslavova   +7 more
doaj   +3 more sources

In Situ Growth, Etching, and Charging of Nanoscale Water Ice Under Fast Electron Irradiation in Environmental TEM [PDF]

open access: yesNanomaterials
Understanding the formation, structural evolution, and response of water ice at the nanoscale is essential for advancing research in fields such as cryo-electron microscopy and atmospheric science.
Hongchen Chu   +6 more
doaj   +2 more sources

Universal cryogenic transfer of liquid metal particles in polymers for wafer-scale stretchable integrated electronics [PDF]

open access: yesNature Communications
Gallium-based liquid metals (LMs) are promising materials for stretchable electronics due to their metallic conductivity and deformability. However, the fabrication of large-area stretchable integrated electronics using LMs on various polymers remains ...
Do Hoon Lee   +19 more
doaj   +2 more sources

Optimization of Soft X-Ray Fresnel Zone Plate Fabrication Through Joint Electron Beam Lithography and Cryo-Etching Techniques [PDF]

open access: yesNanomaterials
The ability to manufacture complex 3D structures with nanometer-scale resolution, such as Fresnel Zone Plates (FZPs), is crucial to achieve state-of-the-art control in X-ray sources for use in a diverse range of cutting-edge applications.
Maha Labani   +5 more
doaj   +2 more sources

Wafer-Scale Electrical Characterization of Al/AlxOy/Al Tunnel Junctions for Process Monitoring at Room Temperature [PDF]

open access: yesNanomaterials
Josephson junctions are key elements in superconducting qubits. Their efficient wafer-scale characterization is crucial for process control and optimization, motivating analysis approaches that extend beyond conventional cryogenic measurements.
Simon Johann Klaus Lang   +15 more
doaj   +2 more sources

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