Results 81 to 90 of about 8,725 (286)
Advanced Healthcare Materials, EarlyView.Surface‐host dialogue at the implant interface governs biological fate and osseointegration. Surface physicochemical properties of titanium (Ti) dental implants, including microgrooves, nanopatterns, nanotopography, roughness, and wettability, modulate the initial adsorption of proteins and the formation of a dynamic biointerface.
Daniela Moreira Cunha +9 more
wiley +1 more source
International Journal of Photoenergy, 2012 For lower reflectance, we applied a maskless plasma texturing technique using reactive ion etching (RIE) on acidic-textured multicrystalline silicon (mc-Si) wafer. RIE texturing had a deep and narrow textured surface and showed excellent low reflectance.
Ji-Myung Shim +12 more
doaj +1 more source
UV-Nanoimprint and Deep Reactive Ion Etching of High Efficiency Silicon Metalenses: High Throughput at Low Cost with Excellent Resolution and Repeatability. [PDF]
Nanomaterials (Basel), 2023 Dirdal CA +8 more
europepmc +1 more source
Characterization and Modeling of Wafer and Die Level Uniformity in Deep Reactive Ion Etching (DRIE)
, 2003 Wafer and die level uniformity effects in Deep Reactive Ion Etching (DRIE) are quantitatively modeled and characterized. A two-level etching model has been developed to predict non-uniformities in high-speed rotating microstructures.
Tyrone Hill +3 more
core +1 more source
Natural Biomaterials for Osteochondral Repair: From Source to Strategy
Advanced Healthcare Materials, EarlyView.Biological origin‐guided overview of natural biomaterials and therapeutic strategies for osteochondral tissue engineering. The circular diagram categorizes representative materials and strategies into plant/algae‐derived, microbial‐derived, animal‐derived, and human‐derived sources, centered on an osteochondral defect repair model.
Hengyu Liu +5 more
wiley +1 more source
A THREE-STEP MODEL OF BLACK SILICON FORMATION IN DEEP REACTIVE ION ETCHING PROCESS
, 2015 A three-step model used for modeling and simulation of black silicon formation in DRIE (Deep Reactive Ion Etching) process is presented. It divides the plasma etching system into plasma layer, sheath layer and sample surface layer.
Xiaosheng Zhang +9 more
core +1 more source
Opportunities of Semiconducting Oxide Nanostructures as Advanced Luminescent Materials in Photonics
Advanced Materials, EarlyView.The review discusses the challenges of wide and ultrawide bandgap semiconducting oxides as a suitable material platform for photonics. They offer great versatility in terms of tuning microstructure, native defects, doping, anisotropy, and micro‐ and nano‐structuring. The review focuses on their light emission, light‐confinement in optical cavities, and
Ana Cremades +7 more
wiley +1 more source
Microfabrication Technologies for Interaction Circuits of THz Vacuum Electronic Devices
MicromachinesAdvances in manufacturing technology are allowing for the realization of interaction circuit with microstructures. The capability to produce small circuit structures is allowing new opportunities for vacuum electronic devices producing terahertz (THz ...
Xinghui Li, Jinjun Feng
doaj +1 more source
New DRIE-Patterned Electrets for Vibration Energy Harvesting
EPJ Web of Conferences, 2012 This paper is about a new manufacturing process aimed at developing stable SiO2/Si3N4 patterned electrets using a Deep Reactive Ion Etching (DRIE) step for an application in electret-based Vibration Energy Harvesters (e-VEH).
Chaillout J.-J. +3 more
doaj +1 more source
Modelling and Fabrication of Micro-SOFC Membrane Structure
Medžiagotyra, 2014 Fabrication process of micro-SOFC membrane structure using the bulk micromachining of silicon technique with SiO2 and Si3N4 sacrificial layers is presented in this study.
Brigita ABAKEVIČIENĖ +6 more
doaj +1 more source