Precision micro-mechanical components in single crystal diamond by deep reactive ion etching. [PDF]
Microsyst Nanoeng, 2018 Toros A +5 more
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Time multiplexed deep reactive ion etching of germanium and silicon-A comparison of mechanisms and application to x-ray optics. [PDF]
J Vac Sci Technol B Nanotechnol Microelectron, 2018 Genova VJ, Agyeman-Budu DN, Woll AR.
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Sensors, 2008 We present a simplified, highly reproducible process to fabricate arrays of tapered silicon micro-funnels and micro-channels using a single lithographic step with a silicon oxide (SiO2) hard mask on at a wafer scale.
Frances S. Ligler, Marie J. Archer
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Formation of silicon nanostructures with a combination of spacer technology and deep reactive ion etching. [PDF]
Nanoscale Res Lett, 2012 Bien DC, Lee HW, Badaruddin SA.
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Suspended Germanium-on-Silicon Photonic Integrated Circuits Operating in the Long-Wave Infrared and Their Use for Ethanol Sensing. [PDF]
ACS PhotonicsLin PS +4 more
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A Wafer-Level Stacking Scheme Based on Hybrid Etching and Low-Temperature Bonding for High-Performance MEMS Devices. [PDF]
Micromachines (Basel)Li P +6 more
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A silicon microneedle array atmospheric pressure plasma ionization source for real-time trace gas chemical analysis. [PDF]
Microsyst NanoengChew BS +6 more
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Advanced BCl<sub>3</sub>-Driven Deep Ion Etching of β-Ga<sub>2</sub>O<sub>3</sub> for Precision High-Aspect-Ratio Nanostructures. [PDF]
Sensors (Basel)Alhalaili B.
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Optimization Method for the Synergistic Control of DRIE Process Parameters on Sidewall Steepness and Aspect Ratio. [PDF]
Micromachines (Basel)Wang D +8 more
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Wet etching of (-102) β-Ga<sub>2</sub>O<sub>3</sub> with tetramethylammonium hydroxide (TMAH). [PDF]
Sci Technol Adv MaterOshima T.
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