Results 151 to 160 of about 6,778 (181)

Affordable method for channel geometry-specific flow control in microfluidics without commercial pumps. [PDF]

Sci Rep
Liu X, Brodský J, Vírostko J, Jarušek J, Migliaccio L, Zítka O, Gablech I, Neužil P.   +7 more
europepmc   +1 more source

Integrated Quasi-Optical Terahertz Liquid Sensor Leveraging Mode-Parity-Dependent Interaction with a Capillary-Confined Analyte. [PDF]

Sensors (Basel)
Klein AK, Webber J, Carpintero G, Fujita M, Headland D.   +4 more
europepmc   +1 more source

Fabrication of Buried Microchannels with Almost Circular Cross-Section Using HNA Wet Etching. [PDF]

Micromachines (Basel)
Yu Q, Veltkamp HW, Wiegerink RJ, Lötters JC.   +3 more
europepmc   +1 more source

Advances in Porous Silicon Materials for Sensing, Energy Storage, and Microelectronics. [PDF]

Nanomaterials (Basel)
Wang Y, Wang D.
europepmc   +1 more source

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High-power optical microswitch fabricated by deep reactive ion etching (DRIE)

SPIE Proceedings, 2003
Development of a high power optical micro switch fabricated by deep reactive ion etching (DRIE) in silicon on insulator (SOI) substrates is presented. The devices discussed are a key component in a MEMS-based, Naval safety and arming (S&A) system for use in underwater weapons.
Kevin R. Cochran, Lawrence Fan, Don L. DeVoe   +2 more
openaire   +1 more source

Uniformity-improving dummy structures for deep reactive ion etching (DRIE) processes

SPIE Proceedings, 2005
In typical DRIE processes, the etch rate variation across the wafer increases with pattern density, severely limiting the pattern densities that can be used at a specified etch rate tolerance. Here, we present a scheme for including uniformity-improving dummy structures in the etch mask layout that enable the use of high-density patterns in many DRIE ...
Soren Jensen, Jonas M. Jensen, Ulrich J. Quaade, Ole Hansen   +3 more
openaire   +1 more source

Developing terahertz filters using the deep reactive ion etching (DRIE) process

2016 IEEE MTT-S International Microwave Workshop Series on Advanced Materials and Processes for RF and THz Applications (IMWS-AMP), 2016
This paper introduces some recent developments of terahertz bandpass filters. By adopting dual-resonating-mode cavities, transmission zeroes are obtained in the design, which greatly improve the selectivity of the terahertz bandpass filters. As demonstrations, terahertz bandpass filters having a center frequency of 400 GHz have been fabricated by using
null Zhang-Cheng Hao, Wei Hong
openaire   +1 more source

Characterization and Modeling of Wafer and Die Level Uniformity in Deep Reactive Ion Etching (DRIE)

MRS Proceedings, 2003
ABSTRACTWafer and die level uniformity effects in Deep Reactive Ion Etching (DRIE) are quantitatively modeled and characterized. A two-level etching model has been developed to predict non-uniformities in high-speed rotating microstructures. The separation of wafer level and die level effects is achieved by sequentially etching wafers with uniformly ...
Hongwei Sun, Tyrone Hill, Martin Schmidt, Duane Boning   +3 more
openaire   +1 more source

AN ultra-low cost deep reactive ion etching (drie) tool for flexible, small volume manufacturing

2015 Transducers - 2015 18th International Conference on Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS), 2015
Our goal is to demonstrate that we can achieve a radical reduction in the capital cost of micro/nano-manufacturing without sacrificing performance by scaling production throughput. As a demonstration of this concept, we show for the first time a DRIE system that processes small substrates (∼1 in2) with performance comparable to commercial systems for a
P.A. Gould, M.D. Hsing, H.Q. Li, K.K. Gleason, M.A. Schmidt   +4 more
openaire   +1 more source