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Dry Etching (Part 1): Particulate Contamination Due to Dry Etching
1998For the mass production of 64 kbit DRAMs, 3 μm design-rule devices, interest in the change from wet to dry etching processes has increased greatly.
openaire +1 more source
Piezoelectric aluminum nitride thin-films: A review of wet and dry etching techniques
Microelectronic Engineering, 2022Rui M R Pinto, K K Nagaraja
exaly
55-3: Development of Low-Temperature Metal Dry-Etching Equipment via ECR Plasma Source
Digest of Technical Papers SID International Symposium, 2022MunPyp Hong, Sangheon Lee
exaly
Philosophical Transactions Series A, Mathematical, Physical, and Engineering Sciences, 2004
C D W Wilkinson
exaly
C D W Wilkinson
exaly
Dry-etching-assisted femtosecond laser machining
Laser and Photonics Reviews, 2017Zhuo-Chen Ma, Qi-Dai Chen, Xue-Qing Liu
exaly
Highly textured multi-crystalline silicon surface obtained by dry etching multi-step process
Solar Energy Materials and Solar Cells, 2013Mario Tucci, Luca Serenelli, M Izzi
exaly

