Results 91 to 100 of about 39,172 (265)

Selective epitaxial growth of stepwise SiGe:B at the recessed sources and drains: A growth kinetics and strain distribution study

open access: yesAIP Advances, 2016
The selective epitaxial growth of Si1-xGex and the related strain properties were studied. Epitaxial Si1-xGex films were deposited on (100) and (110) orientation wafers and on patterned Si wafers with recessed source and drain structures via ultrahigh ...
Sangmo Koo   +3 more
doaj   +1 more source

Epitaxial graphene growth on 3C SiC by Si sublimation in UHV

open access: yes, 2015
This thesis is a step forward in understanding the growth of graphene, a single layer of carbon atoms, by annealing Silicon Carbide (SiC) thin films in Ultra High Vacuum.
Gupta, Bharati
core  

Neuromorphic Electronics for Intelligence Everywhere: Emerging Devices, Flexible Platforms, and Scalable System Architectures

open access: yesAdvanced Materials, EarlyView.
The perspective presents an integrated view of neuromorphic technologies, from device physics to real‐time applicability, while highlighting the necessity of full‐stack co‐optimization. By outlining practical hardware‐level strategies to exploit device behavior and mitigate non‐idealities, it shows pathways for building efficient, scalable, and ...
Kapil Bhardwaj   +8 more
wiley   +1 more source

Strain-relief by single dislocation loops in calcite crystals grown on self-assembled monolayers

open access: yesNature Communications, 2016
Epitaxial crystal growth attracts significant interest. Here, the authors use Bragg Coherent Diffraction Imaging to demonstrate calcite crystal precipitation on self-assembled monolayers exhibiting single dislocation loops with different geometries to ...
Johannes Ihli   +11 more
doaj   +1 more source

Epitaxial graphene growth on FIB patterned 3C-SiC nanostructures on Si (111): Reducing milling damage

open access: yes, 2017
Epitaxial growth of graphene on SiC is a scalable procedure which does not require any further transfer step, making this an ideal platform for graphene nanostructure fabrication.
Josh Lipton-Duffin   +14 more
core   +1 more source

Magnetron sputtering growth of InAs0.3Sb0.7 films on (100) GaAs substrates: Strong effect of growth conditions on film structure [PDF]

open access: yes, 2005
The growth of highly lattice-mismatched InAs0.3Sb0.7 films on (100) GaAs Substrates by magnetron Sputtering has been investigated and even epitaxial lnAs(0.3)Sb(0.7) films have been successfully obtained.
Chen NF   +8 more
core   +1 more source

Unveiling Exsolution‐Induced Giant Electronic and Magnetic Property Changes in Non‐Stoichiometric Titanate Perovskite Thin Films

open access: yesAdvanced Materials, EarlyView.
A giant insulator to metal transition and emergent superparamagnetism are revealed by nanoparticle exsolution in non‐stoichiometric titanate perovskite thin films. By combining transport, synchrotron spectroscopy, and first‐principles calculations, this work reveals how defect reconfiguration and lattice reconstruction fundamentally reshape electronic ...
Sungil Kim   +11 more
wiley   +1 more source

Crystal orientation of epitaxial film deposited on silicon surface

open access: yesScientific Reports
Direct growth of oxide film on silicon is usually prevented by extensive diffusion or chemical reaction between silicon (Si) and oxide materials.
Satoru Kaneko   +13 more
doaj   +1 more source

Ferromagnetism of Molecular Beam Epitaxy‐grown Ultra‐thin Cr2Ge2Te6 Films Down to the Monolayer Limit on Si Substrates

open access: yesAdvanced Materials, EarlyView.
Uniform monolayer Cr2Ge2Te6 films are achieved on Si substrates by molecular beam epitaxy. Intrinsic ferromagnetism with perpendicular magnetic anisotropy is established in the films by anomalous Hall effect and superconducting quantum interference device measurements, albeit with strong magnetic fluctuations characteristic of its 2D nature.
Pengfei Ji   +15 more
wiley   +1 more source

The critical role of hydrocarbon source and growth optimization for high-quality thick 4H-SiC epitaxial layers [Elektronisk resurs]

open access: yes
The development of ultra-high power electronic devices based on 4H-SiC relies on the growth of high-quality thick epitaxial layers. Chloride-based chemical vapor deposition is preferred for this purpose, and in this study we show that optimizing the ...
Ul-Hassan, Jawad,   +3 more
core   +1 more source

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