Results 111 to 120 of about 28,001 (312)

New Separation Method of Threading Dislocations in 4H-SiC Epitaxial Layer by Molten KOH Etching

open access: yes, 2011
A new method for the separation of threading screw dislocations (TSD) and threading edge dislocations (TED) in a 4H-SiC epitaxial layer is proposed by measurement of the etch pit angles.
Fujiwara Hirokazu   +5 more
core   +1 more source

Epitaxial growth of deposited amorphous layer by laser annealing [PDF]

open access: yes, 1978
We demonstrate that a single short pulse of laser irradiation of appropriate energy is capable of recrystallizing in open air an amorphous Si layer deposited on a (100) single-crystal substrate into an epitaxial layer. The laser pulse annealing technique
M-A. Nicolet   +11 more
core   +1 more source

Advancing Lithium–Oxygen Batteries: Pioneering Cathode Catalyst Innovation and Artificial Intelligence‐Driven Design Paradigms

open access: yesAdvanced Materials, EarlyView.
This review summarizes the principles and challenges of nonaqueous lithium‐oxygen batteries and recent advances in cathode catalysts, including carbon‐based materials, metals, oxides, sulfides, nitrides, carbides, and redox mediators. It highlights emerging design strategies and artificial intelligence‐driven approaches, emphasizing data‐assisted ...
Yuqing Yao   +8 more
wiley   +1 more source

Ultrathin Li Metal Anodes: Quantitative Design Principles and Manufacturability Across Liquid and Solid‐State Batteries

open access: yesAdvanced Materials, EarlyView.
Ultrathin lithium metal anodes (≤15 µm) offer a promising route to high‐energy‐density batteries due to their high capacity and low potential. This review presents design principles for ultrathin Li, evaluates fabrication strategies, and discusses challenges in liquid and solid‐state cells.
Cheng Wang   +9 more
wiley   +1 more source

Application of Open Circuit Voltage Decay to the Characterization of p/n+ and n/p+ Epitaxial Layer

open access: yesAdvances in Electrical and Electronic Engineering, 2004
High quality silicon epitaxial layers are inevitable in bipolar and/or unipolar technology. However, its properties are not as easy characterized as those of bulk material.
Milan Tapajna   +4 more
doaj  

Epitaxial liftoff of ZnSe-based heterostructures using a II-VI release layer

open access: yes, 2005
Epitaxial liftoff is a post-growth process by which the active part of a semiconductor heterostructure, the epitaxial layer, is removed from its original substrate and deposited onto a new substrate.
Bradford, C.   +11 more
core   +1 more source

Programmable Stepwise Heteroepitaxial Growth of Colloidal Crystals With Different Phases

open access: yesAdvanced Materials, EarlyView.
Stepwise heteroepitaxial growth is adapted to colloidal crystal engineering with DNA, enabling face‐centered cubic (fcc) facets to grow on body‐centered cubic (bcc) crystals with 110 facets. This approach tolerates large lattice mismatches, extending heteroepitaxy beyond the limits of conventional atomic systems.
Xiaowei Liu   +9 more
wiley   +1 more source

750 V Breakdown in GaN Buffer on 200 mm SOI Substrates Using Reverse-Stepped Superlattice Layers

open access: yesMicromachines
In this work, we demonstrated the epitaxial growth of a gallium nitride (GaN) buffer structure on 200 mm SOI (silicon-on-insulator) substrates. This epitaxial layer is grown using a reversed stepped superlattice buffer (RSSL), which is composed of two ...
Shuzhen You   +11 more
doaj   +1 more source

Double magnetic layer formed in epitaxial garnet films by annealing

open access: yes, 2003
Formation of a second magnetic layer was found in annealed epitaxial magnetic garnet film. The ratio of the layers is controlled by the annealing time. A linear relationship was found between the time of annealing and the thickness of the second layer.
Vértesy, Gábor, Keszei, Béla
core   +1 more source

Ferroelectric Dynamic‐Field‐Driven Nucleation and Growth Model for Predictive Materials‐To‐Circuit Co‐Design

open access: yesAdvanced Materials, EarlyView.
This study presents a compact dynamic‐field‐driven nucleation and growth (DFNG) model that captures ferroelectric switching behavior under arbitrary voltage waveforms. It enables extraction of time‐dependent domain wall velocity and growth dimensionality, which can then be extended to device‐level modeling.
Yi Liang   +10 more
wiley   +1 more source

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