Results 221 to 230 of about 2,578 (231)

Prediction of Material Removal in Polishing Free-Form Surfaces with Fixed Abrasives

Key Engineering Materials, 2004
openaire   +1 more source

Polishing mechanism of single-crystal silicon in fixed-abrasive chemical mechanical polishing with different solutions

Applied Surface Science
Xiaozhe Yang, Shenglong Zhang, Fangming Lian, Xu Yang, Kazuya Yamamura, Zhuangde Jiang   +5 more
openaire   +1 more source

Tungsten chemical-mechanical polishing process using a fixed abrasive polishing pad and a tungsten layer chemical-mechanical polishing solution specifically adapted for chemical-mechanical polishing with a fixed abrasive pad

2001
CHOPRA DINESH, MEIKLE SCOTT G
openaire   +1 more source

Preparation and properties of conductive fixed abrasive polishing discs for electrochemical mechanical polishing of SiC substrates

Materials Science in Semiconductor Processing
Qiufa Luo, Yikun Hu, Yiyang Zhu, Jing Lu, Congming Ke, Hui Huang   +5 more
openaire   +1 more source

Polishing characteristics of fixed-abrasive pad by using nano-aggregate silica

Optics and Precision Engineering, 2016
openaire   +1 more source

Copper chemical-mechanical polishing process using a fixed abrasive polishing pad and a copper layer chemical-mechanical polishing solution specifically adapted for chemical-mechanical polishing with a fixed abrasive pad

2000
openaire   +3 more sources

Investigation on the Removal Mechanism of Fixed Abrasive Polishing SiCp/Al Composites

Guquan Gu, Cheng Zhang, Shujing Wu, Kun Lu, Dazhong Wang   +4 more
openaire   +1 more source

Research on ice fixed-abrasive polishing mechanism and technology for high-definition display panel glass

International Journal of Nanomanufacturing, 2018
exaly  

Slurry for use with fixed-abrasive polishing pads in polishing semiconductor device conductive structures that include copper and tungsten and polishing methods

2002
CHOPRA DINESH, SINHA NISHANT
openaire   +3 more sources

Polishing liquids for activating and/or conditioning fixed abrasive polishing pads, and associated systems and methods

2006
openaire   +2 more sources