Free-Standing Self-Assemblies of Gallium Nitride Nanoparticles: A Review
Gallium nitride (GaN) is an III-V semiconductor with a direct band-gap of 3 . 4 e V . GaN has important potentials in white light-emitting diodes, blue lasers, and field effect transistors because of its super thermal stability and excellent ...
Yucheng Lan +5 more
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Highly Homogeneous Current Transport in Ultra-Thin Aluminum Nitride (AlN) Epitaxial Films on Gallium Nitride (GaN) Deposited by Plasma Enhanced Atomic Layer Deposition. [PDF]
Schilirò E +12 more
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Wide-bandgap semiconductor betavoltaic batteries have a promising prospect in Micro-Electro-Mechanical Systems for high power density and long working life, but their material selection is still controversial.
Jiachen Zhang +6 more
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Ammonolysis of microcrystalline powders of gallium phosphide GaP afforded nanopowders or nanowires of hexagonal gallium nitride GaN.
Mariusz Drygas +2 more
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Impact of Defects on the Low-Field Electron Mobility in GaN-on-Si HEMTs
In this work, we investigate the field and temperature dependence of the electron mobility in aluminum-gallium-nitride/gallium-nitride (AlGaN/GaN) high electron mobility transistors (HEMTs) realized on GaN-on-silicon (Si) substrates.
Ran Zhou +2 more
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This work presents aluminum nitride (AlN)/gallium nitride (GaN)/AlN high electron mobility transistors (HEMTs) on 100 mm silicon carbide (SiC) fabricated using a commercial 150 nm RF GaN foundry process.
Reet Chaudhuri +7 more
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Deep Etched Gallium Nitride Waveguide for Raman Spectroscopic Applications
Gallium nitride (GaN) materials with a high chemical stability and biocompatibility are well suited for bio-sensing applications and evanescent wave spectroscopy.
Yu-Li Hsieh +8 more
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Semi insulating N-gallium nitride (GaN) on sapphire surface reflection dataset obtained at millimeter wave frequencies 107.35-165 GHz. [PDF]
Roy B, Wu MH, Vlahovic B.
europepmc +1 more source
Structural and optical analysis of GaN and InxGa1-xN photodetectors fabricated by PEALD on silicon
The optical, structural, morphological and chemical properties of Gallium nitride (GaN) and Indium Gallium nitride (InxGa1-xN) thin films grown on Si (100) by plasma-assisted atomic layer deposition (PEALD) technique at a temperature of 300°C.
D. Tepatzi-Xahuentitla +10 more
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Gallium Nitride (GaN) High-Electron-Mobility Transistors with Thick Copper Metallization Featuring a Power Density of 8.2 W/mm for Ka-Band Applications. [PDF]
Lin YC +6 more
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