Results 131 to 140 of about 2,685 (171)
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IEEE Transactions on Electron Devices, 2000
Gate induced drain leakage (GIDL) is frequently described by band-to-band tunneling. This mechanism is insensitive to temperature and occurs only under strong electric fields. Under the condition of small electric fields, however, GIDL exhibits a strong dependence on temperature, which is due to trap-assisted generation of electron hole pairs.
M. Rosar, B. Leroy, G. Schweeger
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Gate induced drain leakage (GIDL) is frequently described by band-to-band tunneling. This mechanism is insensitive to temperature and occurs only under strong electric fields. Under the condition of small electric fields, however, GIDL exhibits a strong dependence on temperature, which is due to trap-assisted generation of electron hole pairs.
M. Rosar, B. Leroy, G. Schweeger
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Extended Abstracts of the 2008 International Conference on Solid State Devices and Materials, 2008
Puget, S. +7 more
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Puget, S. +7 more
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Extended Abstracts of the 2002 International Conference on Solid State Devices and Materials, 2002
Yang-Kyu Choi +3 more
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Yang-Kyu Choi +3 more
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IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest., 2005
We demonstrate that for aggressively scaled FinFETs, with 2nm HfO 2 and TiN metal gate (i.e., workfunction close to midgap), several parasitic leakage mechanisms that impact the off-state current become dominant. We provide a detailed characterization of these mechanisms as well as design guidelines for eliminating them by careful junction dopant ...
T. Hoffmann +12 more
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We demonstrate that for aggressively scaled FinFETs, with 2nm HfO 2 and TiN metal gate (i.e., workfunction close to midgap), several parasitic leakage mechanisms that impact the off-state current become dominant. We provide a detailed characterization of these mechanisms as well as design guidelines for eliminating them by careful junction dopant ...
T. Hoffmann +12 more
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Microsystem Technologies, 2017
In this paper a cylindrical Dual Metal (DM) Dielectric Engineered (DE) Gate All Around (GAA) MOSFET has been proposed to resolve a big issue of Gate Inducted Drain leakage (GIDL) current in cylindrical Gate All Around (GAA) MOSFET to enhance the device reliability. Dual Metal Dielectric Engineered Gate All Around (DMDEGAA) MOSFET has been compared with
Sonam Rewari +4 more
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In this paper a cylindrical Dual Metal (DM) Dielectric Engineered (DE) Gate All Around (GAA) MOSFET has been proposed to resolve a big issue of Gate Inducted Drain leakage (GIDL) current in cylindrical Gate All Around (GAA) MOSFET to enhance the device reliability. Dual Metal Dielectric Engineered Gate All Around (DMDEGAA) MOSFET has been compared with
Sonam Rewari +4 more
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A Novel Charge Pumping Technique With Gate-Induced Drain Leakage Current
IEEE Electron Device Letters, 2023A charge pumping (CP) technique with gate-induced drain leakage (GIDL) current is proposed to extract interface trap density ( ${N}_{\text {it}}{)}$ in GAA MOSFETs.
Geon-Beom Lee +2 more
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Effectiveness of Repairing Hot Carrier Degradation in Si p-FinFETs Using Gate Induced Drain Leakage
IEEE Electron Device Letters, 2023In this study, the gate induced drain leakage (GIDL) of Si p-FinFET and its recovery effect on hot carrier degradation (HCD) were experimentally studied to further its physical understanding.
Hao Chang +11 more
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