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Multi-level resistive switching in hafnium-oxide-based devices for neuromorphic computing [PDF]

open access: yesNano Convergence, 2023
In the growing area of neuromorphic and in-memory computing, there are multiple reviews available. Most of them cover a broad range of topics, which naturally comes at the cost of details in specific areas.
Markus Hellenbrand   +1 more
doaj   +3 more sources

Enhancement of Resistive Switching Performance in Hafnium Oxide (HfO2) Devices via Sol-Gel Method Stacking Tri-Layer HfO2/Al-ZnO/HfO2 Structures [PDF]

open access: yesNanomaterials, 2022
Resistive random-access memory (RRAM) is a promising candidate for next-generation non-volatile memory. However, due to the random formation and rupture of conductive filaments, RRMS still has disadvantages, such as small storage windows and poor ...
Yuan-Dong Xu   +7 more
doaj   +3 more sources

Hafnium carbide formation in oxygen deficient hafnium oxide thin films [PDF]

open access: yesApplied Physics Letters, 2016
On highly oxygen deficient thin films of hafnium oxide (hafnia, HfO$_{2-x}$) contaminated with adsorbates of carbon oxides, the formation of hafnium carbide (HfC$_x$) at the surface during vacuum annealing at temperatures as low as 600 {\deg}C is ...
Alff, L.   +8 more
core   +3 more sources

Hafnium Oxide/Graphene/Hafnium Oxide-Stacked Nanostructures as Resistive Switching Media [PDF]

open access: yesACS Applied Nano Materials, 2021
Producción Científica Thin HfO2 films were grown by atomic layer deposition on chemical vapor-deposited large-area graphene. The graphene was transferred, prior to the deposition of the HfO2 overlayer, to the HfO2 bottom dielectric layer pregrown on the Si/TiN substrate.
Tauno Kahro   +12 more
openaire   +3 more sources

Effect of Lanthanum‐Aluminum Co‐Doping on Structure of Hafnium Oxide Ferroelectric Crystals [PDF]

open access: yesAdvanced Science
Hafnium oxide (HfO2)‐based devices have been extensively evaluated for high‐speed and low‐power memory applications. Here, the influence of aluminum (Al) and lanthanum (La) co‐doping HfO2 thin films on the ferroelectric characteristics of hafnium‐based ...
Zhenhai Li   +12 more
doaj   +2 more sources

Self-powered photo-pyroelectric sensing in antiferroelectric Hafnium zirconium memory with asymmetric van der Waals electrodes [PDF]

open access: yesNature Communications
Hafnium zirconium oxide with antiferroelectric polarizations holds great promise for emerging applications such as neuromorphic computing, energy-efficient storage, and nonvolatile memory, owing to its tunable phase transitions, fast switching speed ...
Xia Gan   +7 more
doaj   +2 more sources

Flexoelectricity in amorphous hafnium oxide (HfO2)

open access: yesAPL Materials
Flexoelectricity, inherent in all materials, offers a promising alternative to piezoelectricity for nanoscale actuation and sensing. However, its widespread application faces significant challenges: differentiating flexoelectric effects from those of ...
Daniel Moreno-Garcia   +2 more
doaj   +3 more sources

Investigation of Hafnium Oxide Containing Zirconium in the Scaled Region on the Surface of As-Cast Nickel-Based Single Crystal Superalloy Turbine Blades

open access: yesCrystals, 2023
Surface scale is usually formed in the aerofoil part of as-cast nickel-based single crystal turbine blades by the strong interaction between the mould wall and the melt, and the subsequent oxidation of the fresh metallic surface of the casting.
KeeHyun Park, Paul Withey
doaj   +1 more source

Advances of hafnium based nanomaterials for cancer theranostics

open access: yesFrontiers in Chemistry, 2023
Hafnium-based nanomaterials (Hf-NMs) have attracted the interest of numerous biomedical researchers by their unique properties. Recent years have witnessed significant advancements in the field of Hafnium-based nanomaterials, particularly in the context ...
Jiayi Wang   +6 more
doaj   +1 more source

Determination of the vapour pressure curves and vaporization enthalpies of hafnium alkoxides using thermogravimetric analysis [PDF]

open access: yesRoyal Society Open Science, 2019
In order to identify a volatile metallo-organic precursor for the deposition of hafnium oxide (HfO2) films for atomic layer deposition (ALD) applications, the evaporative properties of hafnium alkoxides (hafnium isopropoxide, hafnium n-propoxide and ...
Changhong Wang   +2 more
doaj   +1 more source

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