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Nanoanalysis of high-k dielectrics on semiconductors
2008 15th International Symposium on the Physical and Failure Analysis of Integrated Circuits, 2008Replacement high-k dielectrics for Si(O,N) in MOSFETs undergo many physical and chemical changes during deposition and processing. The situation is even more complicated when a metal electrode is inserted into the gate stack. Investigation of such systems using advanced nanoanalytical techniques in the transmission electron microscope is discussed.
A. J. Craven, M. MacKenzie, D.W. McComb
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Epitaxial high-k dielectrics on silicon
The Fifth International Conference on Advanced Semiconductor Devices and Microsystems, 2004. ASDAM 2004., 2005Aggressive reduction in the thickness of SiO2-based gate dielectrics in ULSI devices brings about a number offimdamental problems, the most critical ones being reduced dielectric reliability and exponentially increasing leakage (tunneling) current with decreasing oxide thickness.
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Extended Abstracts of International Workshop on Gate Insulator (IEEE Cat. No.03EX765), 2003
We report recent results on the effects of high-temperature forming gas and deuterium anneals on performance and reliability characteristics and the effects of AC and DC stress on bias-temperature instability and time-dependent dielectrics breakdown.
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We report recent results on the effects of high-temperature forming gas and deuterium anneals on performance and reliability characteristics and the effects of AC and DC stress on bias-temperature instability and time-dependent dielectrics breakdown.
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Device Principles of High-K Dielectrics
2006The growth of the semiconductor industr yi nt he last few decades has largely been driven by the growth of integrated circuits (IC) based on complementary metal– oxide–semiconductor (CMOS) technology. CMOS technology uses n-type and p-type field effect transistors (FETs) to produce digita ll ogi ce lements that are superior to other available logic ...
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Gate Dielectrics Integration for 2D Electronics: Challenges, Advances, and Outlook
Advanced Materials, 2023Tianyou Zhai
exaly
Suppressing the Loss of Polymer‐Based Dielectrics for High Power Energy Storage
Advanced Materials, 2023Zhi-Min Dang +2 more
exaly
Polymer Dielectrics with Simultaneous Ultrahigh Energy Density and Low Loss
Advanced Materials, 2021Lin Zhang, , Houbing Huang
exaly
Progress on Polymer Dielectrics for Electrostatic Capacitors Application
Advanced Science, 2022Qing Wang
exaly
Recent advances in rational design of polymer nanocomposite dielectrics for energy storage
Nano Energy, 2020Wenkai Chang, Fan Zhang, Hailong Hu
exaly

