Results 31 to 40 of about 5,577 (264)

Atomic force microscopy data of novel high-k hydrocarbon films synthesized on Si wafers for gate dielectric applications

open access: yesData in Brief, 2020
This article presents data obtained from the atomic force microscopy (AFM) images of ultrathin high-k hydrocarbon (HC) films. The high-k HC films were synthesized on Si(100) wafers at various growth temperatures by using inductively-coupled plasma ...
Jihwan Kwon   +3 more
doaj   +1 more source

Tailoring Functional Properties of Ti–Ni–Cu Shape Memory Alloy Thin Films for MEMS Actuators

open access: yesAdvanced Engineering Materials, EarlyView.
A comprehensive study of critical parameters required to develop well‐performing Ti–Ni–Cu thin film shape memory alloy microactuators is provided. Materials science and device integration aspects are integrated by addressing structural and physical relationships using complementary characterization techniques as well as a practical fabrication solution
Elaheh Akbarnejad   +6 more
wiley   +1 more source

Enhanced Thermal Conductivity and Dielectric Properties of Epoxy Composites with Fluorinated Graphene Nanofillers

open access: yesNanomaterials, 2023
The demand for high-performance dielectrics has increased due to the rapid development of modern electric power and electronic technology. Composite dielectrics, which can overcome the limitations of traditional single polymers in thermal conductivity ...
Jiacheng Zhang   +5 more
doaj   +1 more source

Recycling of NiTi Shape Memory Alloys: Fundamental and Technological Aspects of a Vacuum Induction Melting Processing Route

open access: yesAdvanced Engineering Materials, EarlyView.
The present study investigates recycling of NiTi shape memory alloys via vacuum induction melting. An ingot was synthesized from elemental Ni and Ti and subjected to three subsequent remelting cycles. Remelting increases process durations and impurity levels and adversely affects microstructures and functional properties.
Sakia Sophia Noorzayee   +7 more
wiley   +1 more source

Pentacene-Based Thin Film Transistor with Inkjet-Printed Nanocomposite High-K Dielectrics

open access: yesActive and Passive Electronic Components, 2012
The nanocomposite gate insulating film of a pentacene-based thin film transistor was deposited by inkjet printing. In this study, utilizing the pearl miller to crumble the agglomerations and the dispersant to well stabilize the dispersion of nano-TiO2 ...
Chao-Te Liu, Wen-Hsi Lee, Jui-Feng Su
doaj   +1 more source

Methodology for the Simulation of the Variability of MOSFETs With Polycrystalline High-k Dielectrics Using CAFM Input Data

open access: yesIEEE Access, 2021
In this work, a simulation methodology, whose inputs are Conductive Atomic Force Microscope (CAFM) experimental data, is proposed to evaluate the impact of nanoscale variability sources related to the polycrystallization of high-k dielectrics (i.e ...
A. Ruiz   +5 more
doaj   +1 more source

Current Status and Challenges in Data Collection for Aerospace Coatings Deposited by Plasma Spraying

open access: yesAdvanced Engineering Materials, EarlyView.
An innovative approach has been integrated into the GRENAT project to optimize plasma spraying and coating performance. Raw materials are accelerated and melted in the plasma generated by torches, creating coatings. Monitoring sensors collect process data which are combined with ex situ characterization data.
Lila Randriamananjara   +8 more
wiley   +1 more source

Scalable Dielectrics Technology for 2D Materials Electronics

open access: yesAdvanced Electronic Materials
The integration of dielectrics with two‐dimensional (2D) materials by scalable approaches represents a key requirement and one of the open challenges for the future industrialization of 2D‐based electronics.
Emanuela Schilirò   +4 more
doaj   +1 more source

Challenges and Prospects of Nanoscale MOSFET Scaling: A Review

open access: yesAnbar Journal of Engineering Sciences
This review surveys scaling limitations and solution strategies for nanoscale MOSFETs, including high-k dielectrics, metal gates, FinFETs, GAA devices, and beyond-CMOS technologies.
Ahmed S. Al-Jawadi   +2 more
doaj   +1 more source

X-ray photoelectron spectroscopy study of high-k CeO2/La2O3 stacked dielectrics

open access: yesAIP Advances, 2014
This work presents a detailed study on the chemical composition and bond structures of CeO2/La2O3 stacked gate dielectrics based on x-ray photoelectron spectroscopy (XPS) measurements at different depths.
Jieqiong Zhang   +4 more
doaj   +1 more source

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