Results 161 to 170 of about 2,847 (219)

Using both faces of polar semiconductor wafers for functional devices. [PDF]

open access: yesNature
van Deurzen L   +10 more
europepmc   +1 more source

Two-dimensional buffer breaks substrate limit in III-nitrides epitaxy. [PDF]

open access: yesSci Adv
Sang Y   +18 more
europepmc   +1 more source

Electron transport properties of Al0.3Ga0.7 N/GaN high electron mobility transistor (HEMT)

open access: yesApplied Physics A: Materials Science and Processing, 2020
In this study, a Al 0.3 Ga 0.7 N/GaN high electron mobility transistor (HEMT) structure is grown on a c-oriented sapphire substrate using a metal organic chemical vapor deposition (MOCVD) system. Resistivity (ρ), Hall mobility (μ) and carrier density (n) are measured in 0.01–0.14 T magnetic field range and 25–340 K temperature range.
Ahmet Kursat Bilgili   +2 more
exaly   +4 more sources
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Reliability based design optimization applied to the high electron mobility transistor (HEMT)

Microelectronics Reliability, 2021
Abstract Among the most important components in complex and high-power mechatronic systems is the transistor. The High Electron Mobility Transistor (HEMT) is a technology under development. This paper presents the hybrid Reliability Based Design Optimization (RBDO) method applied to the HEMT technology in order to improve its performance and ...
Bouchaib Radi, Abdelkhalak El Hami
exaly   +2 more sources

The early history of the high electron mobility transistor (HEMT)

IEEE Transactions on Microwave Theory and Techniques, 2002
The early history of the high electron mobility transistor illustrates the way in which a new device idea occurs and is developed towards commercialization. The events which took place in our laboratory are described in this paper.
exaly   +2 more sources

Theoretical Study of InAlN/GaN High Electron Mobility Transistor (HEMT) with a Polarization-Graded AlGaN Back-Barrier Layer

open access: yesElectronics (Switzerland), 2019
An inserted novel polarization-graded AlGaN back barrier structure is designed to enhance performances of In0.17Al0.83N/GaN high electron mobility transistor (HEMT), which is investigated by the two-dimensional drift-diffusion simulations.
Jicong Zhao, Guofeng Yang, Gu Yan
exaly   +2 more sources

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