Results 51 to 60 of about 236 (173)
A novel SOI LDMOS with substrate field plate and variable-k dielectric buried layer
A novel silicon-on-insulator (SOI) lateral double-diffused metal-oxide-semiconductor (LDMOS) structure has been proposed. The new structure features a substrate field plate (SFP) and a variable-k dielectric buried layer (VKBL).
Qi Li +6 more
doaj +1 more source
High figure-of-merit SOI power LDMOS for power integrated circuits
The structural modifications in the conventional power laterally diffused metal-oxide-semiconductor field-effect transistor (LDMOS) are carried out to improve the breakdown voltage, on-resistance, gate-charge and figure-of-merits of the device with ...
Yashvir Singh, Rahul Singh Rawat
doaj +1 more source
Modeling and Simulation of LDMOS Device
Laterally Diffused MOSFET (LDMOS) are widely used in modern communication industry and other applications. LDMOS offers various advantages over conventional MOSFETs with little process change. In the present paper, an LDMOS device is modeled and simulated in SILVACO device simulator package using the ATHENA and ATLAS modules.
Sunitha HD, Keshaveni N
openaire +1 more source
Bringing MRI to low‐ and middle‐income countries: Directions, challenges and potential solutions
While MRI technology has advanced, several socioeconomic and technological challenges remain as barriers to MRI access globally. In this paper, we have described a holistic framework that tackles numerous different aspects to provide a structure for future research and development.
Sanjana Murali +10 more
wiley +1 more source
We identify an optimum channel length for planar Laterally Diffused Metal-Oxide-Semiconductor (LDMOS) field-effect transistors, in terms of the specific on-resistance, through systematic device simulation and optimization.
Ali Saadat +3 more
doaj +1 more source
In this paper, an automatic optimal design method for field plate (FP) in silicon on insulator lateral double‐diffused metal oxide semiconductor using simulated annealing algorithm is proposed. For a given device structure, the framework can automatically design the FP geometry parameters within the definite range that maximizes the device breakdown ...
Jing Chen +7 more
wiley +1 more source
Analysis of Kirk effect of an innovated high side Side-Isolated N-LDMOS device
An ESOA of LDMOS device is very critical for power device performance. Kirk effect is the one of the major problem which leads to poor ESOA performance. The cause of the problem mainly due to the high beta value of parasitic NPN transistor in the p-body.
Lai Ciou Jhong +8 more
doaj +1 more source
Double silicon drift layers are used to reduce the specific on-resistance (Ron,sp) for a trench-gate-integrated lateral double-diffused MOSFET (DDL TG LDMOS) based on SOI technology in this paper.
Yuan Wang +7 more
doaj +1 more source
Electrical current disrupts the electron transfer in defined consortia
Abstract Improving methane production through electrical current application to anaerobic digesters has garnered interest in optimizing such microbial electrochemical technologies, with claims suggesting direct interspecies electron transfer (DIET) at the cathode enhances methane yield.
Mon Oo Yee +2 more
wiley +1 more source
Evolution of Black‐Box Models Based on Volterra Series
This paper presents a historical review of the many behavioral models actually used to model radio frequency power amplifiers and a new classification of these behavioral models. It also discusses the evolution of these models, from a single polynomial to multirate Volterra models, presenting equations and estimation methods.
Daniel D. Silveira +3 more
wiley +1 more source

