Results 61 to 70 of about 236 (173)

High-voltage (100 V) ChipfilmTM single-crystal silicon LDMOS transistor for integrated driver circuits in flexible displays [PDF]

open access: yesAdvances in Radio Science, 2009
System-in-Foil (SiF) is an emerging field of large-area polymer electronics that employs new materials such as conductive polymers and electrophoretic micro-capsules (E-Ink) along with ultra-thin and thus flexible chips.
J. N. Burghartz, H. Richter, A. Asif
doaj  

Unified Analytical Model for SOI LDMOS With Electric Field Modulation

open access: yesIEEE Journal of the Electron Devices Society, 2020
The unified analytical model is proposed for SOI LDMOS (Silicon On Insulator Lateral Double-diffused Metal Oxide Semiconductor) based on the electric field modulation in this paper for the first time.
Baoxing Duan   +3 more
doaj   +1 more source

120V Low Side LDMOS Device with Sided Isolation of 0.35μm CMOS Compatible Process

open access: yesMATEC Web of Conferences, 2018
In this paper, a novel 120V multiple RESURF lateral double-diffused MOS (LDMOS) transistor with shallow trench isolation (STI) structure in low side is developed and successfully simulated.
Deivasigamani Ravi   +5 more
doaj   +1 more source

Reducing specific on-resistance for a trench SOI LDMOS with L-shaped P/N pillars

open access: yesResults in Physics, 2020
To reduce specific on-resistance (Ron,sp) of power devices, a novel SOI (silicon-on-insulator) trench gate LDMOS with heavily doping L-shaped P/N pillars and vertical dual-trench-gates is proposed in this paper, and its physical mechanism and electrical ...
Jingwei Guo   +6 more
doaj   +1 more source

Characterization and Modeling of SH in Multi-Finger RF LDMOS Transistors Using BSIM-BULK Model

open access: yesIEEE Journal of the Electron Devices Society
In this work, we present self-heating (SH) characterization and modeling of 130 nm Bipolar-CMOS-DMOS (BCD) technology node multi-finger Laterally Diffused Metal-Oxide-Semiconductor (LDMOS) transistors using extensive DC and S-parameter ...
Ayushi Sharma   +5 more
doaj   +1 more source

Numerical investigation on L-shaped vertical field plate in high-voltage LDMOS

open access: yesResults in Physics, 2019
In this work, an L-shaped vertical field plate (LVFP) is introduced in high-voltage lateral double-diffused MOSFET (LDMOS). The LVFP is embedded in an oxide trench that penetrates into the drift region. Compared with the conventional vertical field plate
Yue Hu   +5 more
doaj   +1 more source

An Analytical Breakdown Model for the SOI LDMOS With Arbitrary Drift Doping Profile by Using Effective Substrate Voltage Method

open access: yesIEEE Journal of the Electron Devices Society, 2020
To elaborate on the relationship between sophisticated 2-D doping profile of drift region and device's breakdown behavior, a unified analytical model for the SOI LDMOS is developed in this paper.
Kemeng Yang   +6 more
doaj   +1 more source

Reduction of Self-heating effect in LDMOS devices

open access: yesCoRR, 2016
17 pages, 5 ...
Tapas Kumar Maiti, Chinmay K. Maiti
openaire   +2 more sources

Optimizing Shortwave Wideband RF Amplifier: Study of Transmission Line Transformer Construction Methods [PDF]

open access: yesRadioengineering
This paper presents a study of six physical transmission line transformers (TLTs) designed to provide wideband output matching for laterally diffused metal oxide semiconductor (LDMOS) transistors within a push-pull amplifier operating in the 1.8-30 MHz ...
G. Krupa, G. Budzyn
doaj  

A Trench LDMOS Improved by Quasi Vertical Super Junction and Resistive Field Plate

open access: yesIEEE Journal of the Electron Devices Society, 2019
An improved trench lateral double-diffused MOSFET (T-LDMOS) is proposed. It has a quasi vertical super junction (QVSJ) drift region and adopts a resistive field plate (RFP) to help QVSJ satisfy charge-balance.
Junji Cheng   +4 more
doaj   +1 more source

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