Results 11 to 20 of about 213,422 (311)

Strategic Review of Arsenide, Phosphide and Nitride MOSFETs [PDF]

open access: yesЖурнал нано- та електронної фізики, 2011
Metal oxide semiconductor field effect transistor used as an amplifier and switch uses Si primarily as a channel material for its very stable oxide SiO2.
Gourab Dutta   +3 more
doaj   +3 more sources

Vertical field-effect transistors in III-V semiconductors [PDF]

open access: yes, 1984
Vertical metal-semiconductor field-effect transistors in GaAs/GaAlAs and vertical metal-oxide-semiconductor field-effect transistors (MOSFET's) in InP/GaInPAs materials have been fabricated.
Kapon, E.   +5 more
core   +1 more source

CMOS Terahertz Metamaterial Based 64 × 64 Bolometric Detector Arrays [PDF]

open access: yes, 2017
We present two terahertz detectors composed of microbolometer sensors (vanadium oxide and silicon pn diode) and metamaterial absorbers monolithically integrated into a complementary metal oxide semiconductor (CMOS) process.
Cumming, David R.S.   +3 more
core   +1 more source

Recent Progress on Semiconductor-Interface Facing Clinical Biosensing

open access: yesSensors, 2021
Semiconductor (SC)-based field-effect transistors (FETs) have been demonstrated as amazing enhancer gadgets due to their delicate interface towards surface adsorption. This leads to their application as sensors and biosensors.
Mingrui Zhang, Mitchell Adkins, Zhe Wang
doaj   +1 more source

Test of scaling theory in two dimensions in the presence of valley splitting and intervalley scattering in Si-MOSFETs [PDF]

open access: yes, 2009
We show that once the effects of valley splitting and intervalley scattering are incorporated, renormalization group theory consistently describes the metallic phase in silicon metal-oxide-semiconductor field-effect transistors down to the lowest ...
A. M. Finkel’stein   +5 more
core   +3 more sources

Current trends in changing the channel in MOSFETs by III–V semiconducting nanostructures

open access: yesNanotechnology Reviews, 2017
The quest for high device density in advanced technology nodes makes strain engineering increasingly difficult in the last few decades. The mechanical strain and performance gain has also started to diminish due to aggressive transistor pitch scaling. In
John Chelliah Cyril R.A.   +1 more
doaj   +1 more source

Focused Review on Print‐Patterned Contact Electrodes for Metal‐Oxide Thin‐Film Transistors

open access: yesAdvanced Materials Interfaces, 2023
Metal‐oxide‐semiconductor‐based thin‐film transistors (TFTs) are exploited in display backplanes and X‐ray detectors fabricated by vacuum deposition and lithographic patterning.
Fei Liu   +3 more
doaj   +1 more source

Simulation of forward current-voltage characteristics for Schottky diodes with MOS trenches

open access: yesДоклады Белорусского государственного университета информатики и радиоэлектроники, 2021
Present work is devoted to the development of a mathematical model for the forward current-voltage characteristic of Schottky diodes with a metal – oxide – semiconductor (MOS) trench structure, which takes into account the accumulation of the main ...
J. A. Solovjov
doaj   +1 more source

Research progress of preparation process of graphene/ semiconductor metal oxide composite photocatalysts

open access: yesGongye shui chuli
Photocatalysts are widely used in water pollution treatment,air purification,disease treatment and environmental remediation because of their strong oxidation,high chemical stability,environmentally friendly and non-toxicity.
WANG Ning   +5 more
doaj   +1 more source

Static characteristics of CMOS digital circuit based on transition metal dichalcogenide transistors

open access: yesAIP Advances, 2019
Static characteristics of digital combinational logic circuits and Schmitt triggers based on two-dimensional (2D) transition metal dichalcogenides (TMDs) have been systematically explored.
F. F. Mao   +4 more
doaj   +1 more source

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