Results 101 to 110 of about 40,351 (278)

Carbon-Related Defects as a Source for the Enhancement of Yellow Luminescence of Unintentionally Doped GaN

Nanomaterials, 2018
Yellow luminescence (YL) of unintentionally doped GaN (u-GaN) peaking at about 2.2 eV has been investigated for decades, but its origin still remains controversial. In this study, ten u-GaN samples grown via metalorganic chemical vapor deposition (MOCVD)
Feng Liang, Degang Zhao, Desheng Jiang, Zongshun Liu, Jianjun Zhu, Ping Chen, Jing Yang, Shuangtao Liu, Yao Xing, Liqun Zhang, Mo Li, Yuantao Zhang, Guotong Du   +12 more
doaj   +1 more source

Toward ferroelectric AlN/GaN heterostructures and sputtered III-N thin films with metal organic chemical vapor deposition-like texture

Communications Materials
Merging III-N-technology and wurtzite ferroelectricity could enable novel devices with enhanced functionality, for instance, harsh environment ferroelectric non-volatile memories and neuromorphic components.
Georg Schönweger, Niklas Wolff, Md Redwanul Islam, Isabel Streicher, Stefano Leone, Lorenz Kienle, Simon Fichtner   +6 more
doaj   +1 more source

Health and efficiency in MOCVD

III-Vs Review, 2005
Several clear trends are appearing in the ongoing development of epitaxial processes such as MOCVD. One over-riding requirement is yield/efficiency, others include conformance to pollution control and these often go hand in hand. Throughput and yield are of paramount importance so as to continually reduce the cost of epiwafers and hence devices.
openaire   +1 more source

MOCVD of Cobalt Oxide Using Co-Actylacetonate As Precursor: Thin Film Deposition and Study of Physical Properties [PDF]

Журнал нано- та електронної фізики, 2011
Metal Organic Chemical Vapor Deposition (MOCVD) is the deposition method of choice for achieving conformal uniform (composition and thickness) continuous thin films over the micron geometry topology necessary for implementing advanced devices. Thin films
S.M. Jogade, P.S. Joshi, B.N. Jamadar, D.S. Sutrave   +3 more
doaj  

Visible-light photocatalytic activity and recyclability of N-doped TiO2 films grown by MOCVD [PDF]

, 2020
Eduardo Conceição de Oliveira, Rodrigo Teixeira Bento, Olandir Vercíno Corrêa, Marina Fuser Pillis   +3 more
openalex   +1 more source

Relation between thickness, crystallite size and magnetoresistance of nanostructured La1−xSrxMnyO3±δ films for magnetic field sensors

Beilstein Journal of Nanotechnology, 2019
In the present study the advantageous pulsed-injection metal organic chemical vapour deposition (PI-MOCVD) technique was used for the growth of nanostructured La1−xSrxMnyO3±δ (LSMO) films on ceramic Al2O3 substrates.
Rasuole Lukose, Valentina Plausinaitiene, Milita Vagner, Nerija Zurauskiene, Skirmantas Kersulis, Virgaudas Kubilius, Karolis Motiejuitis, Birute Knasiene, Voitech Stankevic, Zita Saltyte, Martynas Skapas, Algirdas Selskis, Evaldas Naujalis   +12 more
doaj   +1 more source

High Operating Temperature InAs/GaSb Superlattice Based Mid Wavelength Infrared Photodetectors Grown by MOCVD [PDF]

, 2021
He Zhu, Jia-Feng Liu, Hong Zhu, Yunlong Huai, Meng Li, Zhen Liu, Yong Huang   +6 more
openalex   +1 more source

In-situ deposition of YBCO high-Tc superconducting thin films by MOCVD and PE-MOCVD [PDF]

Metal-Organic Chemical Vapor Deposition (MOCVD) offers the advantages of a high degree of compositional control, adaptability for large scale production, and the potential for low temperature fabrication.
Chern, C., Gallois, B., Kear, B., Li, Y. Q., Noh, D. W., Norris, P. E., Zhao, J.   +6 more
core   +1 more source

Characterization of Nanosized Al2O3 Powder Synthesized by Thermal-Assisted MOCVD and Plasma-Assisted MOCVD [PDF]

Iranian Journal of Chemistry & Chemical Engineering, 2011
Nanosized Al2O3 powder is synthesized by thermal Metal Organic Chemical Vapor Deposition (MOCVD)combined withplasma. The effects of reaction temperature, pressure, Al(CH3)3 (TMA) concentration and reactant gases (CO2 and O2) on the characteristics of the
Han Shizhong, Chen Jinghui, Zheng Peng,, Qing Pang   +3 more
doaj  

Real‐Time Monitoring of 2D TMDC MOCVD: An In Situ Spectroscopic Reflectance Approach

Advanced Materials Interfaces
Metal–organic chemical vapor deposition (MOCVD) has become a well‐established technique to grow 2D transition metal dichalcogenide (TMDC) materials on large scale with high reproducibility.
Songyao Tang, Yibing Wang, Hleb Fiadziushkin, Yingfang Ding, Amir Ghiami, Michael Heuken, Andrei Vescan, Holger Kalisch   +7 more
doaj   +1 more source