Results 21 to 30 of about 40,351 (278)

The Structure and Chemical Composition of the Cr and Fe Pyrolytic Coatings on the MWCNTs’ Surface According to NEXAFS and XPS Spectroscopy

Nanomaterials, 2020
The paper is devoted to the structure and properties of the composite material based on multi-walled carbon nanotubes (MWCNTs) covered with pyrolytic iron and chromium.
Danil Sivkov, Olga Petrova, Alena Mingaleva, Anatoly Ob’edkov, Boris Kaverin, Sergey Gusev, Ilya Vilkov, Sergey Isaenko, Dmitriy Bogachuk, Roman Skandakov, Viktor Sivkov, Sergey Nekipelov   +11 more
doaj   +1 more source

Effects of LP-MOCVD prepared TiO2 thin films on the in vitro behavior of gingival fibroblasts [PDF]

, 2011
We report on the in vitro response of human gingival fibroblasts (HGF-1 cell line) to various thin films of titanium dioxide (TiO2) deposited on titanium (Ti) substrates by low pressure metal-organic chemical vapor deposition (LP-MOCVD).
Cimpean, A., Ciofrangean, C.M., Gleizes, Alain, Popescu, Simona   +3 more
core   +2 more sources

MOCVD AND PLASMA MOCVD OF METAL OXIDE FILMS

Le Journal de Physique Colloques, 1989
No abstract ...
Weglicki, P., Cao, Z., Skillen, N., Owen, J., Moseley, P.   +4 more
openaire   +1 more source

Monometallic Pd and Pt and Bimetallic Pd-Pt/Al2O3-TiO2 for the HDS of DBT: Effect of the Pd and Pt Incorporation Method

Journal of Chemistry, 2014
The effect of the preparation method of monometallic Pd and Pt and bimetallic Pd-Pt/Al2O3-TiO2 catalysts on the hydrodesulfurization (HDS) of dibenzothiophene (DBT) was investigated in this study.
Reynaldo Martínez Guerrero, Agileo Hernández-Gordillo, Víctor Santes, Jorge Roberto Vargas García, José Escobar, Leonardo Díaz-García, Lucía Díaz Barriga Arceo, Vicente Garibay Febles   +7 more
doaj   +1 more source

Low Temperature MOCVD-Processed Alumina Coatings [PDF]

, 2006
We first present a Review about the preparation of alumina as thin films by the technique of MOCVD at low temperature (550°C and below). Then we present our results about thin films prepared by the low pressure MOCVD technique, using aluminium tri ...
Gleizes, Alain, Samélor, Diane, Sovar, Maria-Magdalena, Vahlas, Constantin   +3 more
core   +1 more source

Chemical vapour deposition and atomic layer deposition of amorphous and nanocrystalline metallic coatings: towards deposition of multimetallic films [PDF]

, 2009
This paper provides a prospective insight on chemical vapour deposition (CVD) and atomic layer deposition (ALD) as dry techniques for the processing of amorphous and nanocrystalline metallic thin films.
Blanquet, Elisabeth, Mantoux, Arnaud, Pons, Michel, Vahlas, Constantin   +3 more
core   +5 more sources

The mechanical properties of thin alumina film deposited by metal-organic chemical vapour deposition [PDF]

, 1995
Amorphous alumina films were deposited by metal-organic chemical vapour deposition (MOCVD) on stainless steel, type AISI 304. The MOCVD experiments were performed in nitrogen at low and atmospheric pressures. The effects of deposition temperature, growth
Fransen, T., Gellings, P.J., Haanappel, V.A.C., Haanappel, V.A.C., Metselaar, H.S.C., van Corbach, H.D., van de Vendel, D.   +6 more
core   +3 more sources

Sharp interfaces in p+-AlGaAs/n-GaAs epitaxial structures obtained by MOCVD

Tekhnologiya i Konstruirovanie v Elektronnoi Apparature, 2014
The complexity of forming sharp and high-quality boundaries in p+AlGaAs/n-GaAs systems by MOCVD method is caused by differing on 80–120°С optimal crystallization temperature of GaAs layers and n-AlGaAs solid solutions.
N. M. Vakiv, S. I. Krukovskii, S. Yu. Larkin, A. Yu. Avksent'ev, R. S. Krukovskii   +4 more
doaj   +1 more source

Thin alumina and silica films by chemical vapor deposition (CVD) [PDF]

, 1993
Alumina and silica coatings have been deposited by MOCVD (Metal Organic Chemical Vapor Deposition) on alloys to protect them against high temperature corrosion.
Fransen, T., Gellings, P.J., Hofman, R., Hofman, R., Morsinkhof, R.W.J., Morssinkhof, R.W.J., Westheim, J.G.F., Westheim, J.G.F.   +7 more
core   +3 more sources

Realization of exciton-polariton condensation in GaAs-based microcavity grown by metalorganic chemical vapor deposition

Physical Review Research, 2022
Metalorganic chemical vapor deposition (MOCVD) has not been often used for studying exciton-polariton condensation and developing polaritonic devices, although it is a powerful mass productive method for practical applications.
Daegwang Choi, Min Park, Chan-Young Sung, Hyoungsoon Choi, Yong-Hoon Cho   +4 more
doaj   +1 more source