Results 21 to 30 of about 2,908 (186)
Theory of MOCVD Growth of III-V Nanowires on Patterned Substrates
An analytic model for III-V nanowire growth by metal organic chemical vapor deposition (MOCVD) in regular arrays on patterned substrates is presented. The model accounts for some new features that, to the author’s knowledge, have not yet been considered.
Vladimir G. Dubrovskii
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Copper dithiocarbamate and aluminium dithiocarbamate were prepared and then characterized by infrared spectroscopy. The combination of the prepared precursors in different ratios was deposited on glass substrates using metal-organic chemical vapour ...
J. Damisa +4 more
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We investigated the process parameters of the high temperature MOCVD (HT-MOCVD) numerical model for the AlN growth based on CFD simulation using orthogonal test design.
Jiadai An +3 more
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The paper is devoted to the structure and properties of the composite material based on multi-walled carbon nanotubes (MWCNTs) covered with pyrolytic iron and chromium.
Danil Sivkov +11 more
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MOCVD AND PLASMA MOCVD OF METAL OXIDE FILMS
No abstract ...
Weglicki, P. +4 more
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The effect of the preparation method of monometallic Pd and Pt and bimetallic Pd-Pt/Al2O3-TiO2 catalysts on the hydrodesulfurization (HDS) of dibenzothiophene (DBT) was investigated in this study.
Reynaldo Martínez Guerrero +7 more
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Sharp interfaces in p+-AlGaAs/n-GaAs epitaxial structures obtained by MOCVD
The complexity of forming sharp and high-quality boundaries in p+AlGaAs/n-GaAs systems by MOCVD method is caused by differing on 80–120°С optimal crystallization temperature of GaAs layers and n-AlGaAs solid solutions.
N. M. Vakiv +4 more
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Metalorganic chemical vapor deposition (MOCVD) has not been often used for studying exciton-polariton condensation and developing polaritonic devices, although it is a powerful mass productive method for practical applications.
Daegwang Choi +4 more
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An inductively coupled plasma metal organic chemical vapor deposition (ICP-MOCVD) based on showerhead structure is proposed for the low temperature growth of thin solid films including GaN.
Zixuan Zhang +11 more
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Epitaxial growth of β-Ga2O3 by hot-wall MOCVD
The hot-wall metalorganic chemical vapor deposition (MOCVD) concept, previously shown to enable superior material quality and high performance devices based on wide bandgap semiconductors, such as Ga(Al)N and SiC, has been applied to the epitaxial growth
Daniela Gogova +13 more
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