Results 11 to 20 of about 271,965 (237)
As technology develops, the stacked nanosheet (NS) structure demonstrates promise for use in future technology nodes. This study demonstrated the excellent performance of stacked-NS channels with junctionless gate-all-around thin-film transistors and ...
Yu-Ru Lin +3 more
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Non-destructive stress characterization is essential for gate-all-around (GAA) nanosheet (NS) transistors technology, while it is a big challenge to be realized on nanometer-sized GAA devices by using traditional Micro-Raman spectroscopy due to its light
Huang Ziqiang +10 more
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Silicon displacement defects are caused by various effects. For instance, epitaxial crystalline silicon growth and ion implantation often result in defects induced by the fabrication process, whereas displacement damage is induced by terrestrial cosmic ...
Jonghyeon Ha +5 more
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Using first-principles calculation, geometrical stability together with electronic properties of graphdiyne nanosheet (Gdn-NS) is investigated. The structural stability of Gdn-NS is established with the support of phonon band structure and cohesive ...
V. Nagarajan, R. Chandiramouli
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A Review of Reliability in Gate-All-Around Nanosheet Devices
The gate-all-around (GAA) nanosheet (NS) field-effect-transistor (FET) is poised to replace FinFET in the 3 nm CMOS technology node and beyond, marking the second seminal shift in device architecture across the extensive 60-plus-year history of MOSFET ...
Miaomiao Wang
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Fluorescent iron nanoclusters are emerging fluorescent nanomaterials. Herein, we synthesized hemoglobin-coated iron nanoclusters (Hb−Fe NCs) with a significant fluorescence emission peak at 615 nm and investigated the inner-filter effect of fluorescence ...
Liang Zhao +4 more
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In this study, we demonstrate binary and ternary logic-in-memory (LIM) operations of inverters and NAND and NOR gates comprising nanosheet (NS) feedback field-effect transistors (FBFETs) with a triple-gated structure. The NS FBFETs are reconfigured in p-
Jongseong Han +4 more
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An Overview of Hot Carrier Degradation on Gate-All-Around Nanosheet Transistors
Gate-All-Around (GAA) Nanosheet (NS) transistors have been identified as the device architecture for 3 nm and beyond as they provide additional scaling benefits.
Huimei Zhou
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In this study, a triple‐gated transistor with a p+‐i‐n+ silicon nanosheet (NS) is proposed as a single synaptic device, and bidirectional synaptic functions are realized using reconfigurable memory characteristics. The triple‐gated NS transistor features
Yunwoo Shin +5 more
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Surface-Selective Pt Enrichment for Stabilizing Ultrathin 2D PtCu Nanosheets Toward Durable Oxygen Reduction. [PDF]
Ultrathin 2D alloy nanosheet catalysts could offer exceptional catalytic activity but suffer from severe structural instability. Here, a surface‐selective Pt enrichment strategy via galvanic replacement effectively stabilizes PtCu Nanosheets while preserving their ∼ 1 nm thickness and (111) facets.
Yang HJ +7 more
europepmc +2 more sources

